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首页|期刊导航|光:科学与应用(英文版)|Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation

Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation

Yifeng Shao Sven Weerdenburg Jacob Seifert H.Paul Urbach Allard P.Mosk Wim Coene

光:科学与应用(英文版)2024,Vol.13Issue(10):2156-2167,12.
光:科学与应用(英文版)2024,Vol.13Issue(10):2156-2167,12.DOI:10.1038/s41377-024-01558-3

Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation

Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation

Yifeng Shao 1Sven Weerdenburg 2Jacob Seifert 3H.Paul Urbach 2Allard P.Mosk 3Wim Coene4

作者信息

  • 1. Imaging Physics Department,Applied Science Faculty,Delft University of Technology,Lorentzweg 1,Delft 2628 CJ,The Netherlands||Nanophotonics,Debye Institute for Nanomaterials Science and Center for Extreme Matter and Emergent Phenomena,Utrecht University,P.O.Box 80000,Utrecht 3508 TA,The Netherlands
  • 2. Imaging Physics Department,Applied Science Faculty,Delft University of Technology,Lorentzweg 1,Delft 2628 CJ,The Netherlands
  • 3. Nanophotonics,Debye Institute for Nanomaterials Science and Center for Extreme Matter and Emergent Phenomena,Utrecht University,P.O.Box 80000,Utrecht 3508 TA,The Netherlands
  • 4. Imaging Physics Department,Applied Science Faculty,Delft University of Technology,Lorentzweg 1,Delft 2628 CJ,The Netherlands||Research Department,ASML Netherlands B.V,De Run 6501,Veldhoven 5504 DR,The Netherlands
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摘要

引用本文复制引用

Yifeng Shao,Sven Weerdenburg,Jacob Seifert,H.Paul Urbach,Allard P.Mosk,Wim Coene..Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation[J].光:科学与应用(英文版),2024,13(10):2156-2167,12.

基金项目

This publication is part of the project Lensless Imaging of 3D Nanostructures with Soft X-Rays(LINX)with project number P16-08 of the Perspectief research programme financed by the Dutch Research Council(NWO).The authors acknowledge Mengqi Du,Antonios Pelekanidis,Professor Stefan Witte(Advanced Research Center for Nanolithography),Christina Porter(ASML Research),Ruud Schmits,and Andrea Scardaoni(TNO)for providing consultancy and testing samples and datasets during the development of our algorithm.We also thank our dedicated technician,Roland Horsten,for his important work on hardware and software. (LINX)

光:科学与应用(英文版)

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2095-5545

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