光学精密工程2024，Vol.32Issue(19)：2933-2944,12.DOI:10.37188/OPE.20243219.2933
晶圆飞拍成像系统的快速均匀曝光控制
Rapid and uniform exposure control for wafer motion imaging system
摘要
Abstract
The exposure control of wafer motion imaging systems greatly affects image quality.Tradition-al spatial domain-based algorithms are complex and overlook differences in die features,causing uneven ex-posure.To solve this,we propose a method using frequency domain evaluation through image partition-ing.This method uses a block-based dual-threshold segmentation algorithm to adaptively segment image features.By combining high-pass filtering with a Gaussian pyramid algorithm,it efficiently extracts high-frequency information.A region-weighted evaluation function is crafted to evaluate uniform exposure ef-fects.Furthermore,a decision tree-based search algorithm with variable steps is introduced to quickly find optimal exposure parameters.Experiments show this algorithm improves image quality by 1.34%and re-duces exposure adjustment time by 61.3%,ensuring fast imaging quality in wafer motion imaging.关键词
曝光控制/频率域分析/图像评价函数/变步长搜索/决策树Key words
exposure control/frequency domain analysis/image evaluation function/variable step search/decision tree分类
物理学引用本文复制引用
王若宇,严富洋,刘暾东..晶圆飞拍成像系统的快速均匀曝光控制[J].光学精密工程,2024,32(19):2933-2944,12.基金项目
国家市场监督总局科技计划项目(No.S2022MK0501) （No.S2022MK0501）
