强激光与粒子束2024，Vol.36Issue(12)：36-41,6.DOI:10.11884/HPLPB202436.240025
Al/Ta-Nb合金阻抗匹配靶的制备工艺研究
Fabrication technology of Al/Ta-Nb alloy impedance matching target
摘要
Abstract
To obtain the equation of state(EOS)of tantalum-niobium alloy(Ta-Nb)materials under high pressure,a type of Al/Ta-Nb impedance matching target for laser EOS experiments was fabricated.The processes of precision rolling and femtosecond laser cutting of Ta-Nb alloy foil were studied.A step sample of Ta-Nb alloy with a thickness of 13 μm and a width of 400 μm was obtained.Ta-Nb alloy step was assembled with Al standard material using polyvinyl alcohol(PVA)hydrosol.The surface morphology,step thickness and sample density of the target were measured by white light interferometer and electronic densitometer.The results show that the Al/Ta-Nb alloy impedance matching target fabricated can meet the requirements of laser EOS experiments.关键词
Ta-Nb合金/阻抗匹配靶/状态方程/精密轧制/飞秒激光Key words
Ta-Nb alloy/impedance matching target/equation of state/precision rolling/femtosecond laser分类
能源科技引用本文复制引用
谢志勇,叶君建,贾果,方智恒,贺芝宇,舒桦,涂昱淳,黄秀光,傅思祖..Al/Ta-Nb合金阻抗匹配靶的制备工艺研究[J].强激光与粒子束,2024,36(12):36-41,6.基金项目
中科院战略性先导科技专项(XDA25040301) （XDA25040301）
