机电工程技术2024，Vol.53Issue(11)：60-66,7.DOI:10.3969/j.issn.1009-9492.2024.11.014
芬顿辅助的化学机械抛光研究进展
Research Progress of Fenton Chemical-mechanical Polishing
摘要
Abstract
With the rapid development of the electronic information manufacturing industry,the surface quality of workpieces with GaN,SiC and other substrate materials is increasingly demanding.Fenton chemical-mechanical polishing is widely used in the surface flattening of various materials.Compared with traditional chemical-mechanical polishing,Fenton chemical-mechanical polishing has significant advantages such as high quality and no sub-surface damage on hard and brittle materials and difficult-to-machine materials.By summarizing the processing principle of Fenton chemical-mechanical polishing method,the influence of different factors on Fenton chemical-mechanical polishing effect is elaborated,including the catalyst type of Fenton-reaction solution,the concentration of hydrogen peroxide,the pH,and the mechanical removal effect of abrasives and other factors.Finally,some suggestions on the development trend of Fenton chemical-mechanical polishing are put forward.关键词
芬顿反应/化学机械抛光/催化剂/磨料Key words
Fenton reaction/chemical mechanical polishing/catalyst/abrasive分类
矿业与冶金引用本文复制引用
李银桃,关浩龙,郭英晖..芬顿辅助的化学机械抛光研究进展[J].机电工程技术,2024,53(11):60-66,7.基金项目
广西职业教育教学改革研究项目(GXZZJG2022B056) （GXZZJG2022B056）
