Direct Photolithography of WO_(x) Nanoparticles for High‑Resolution Non‑Emissive DisplaysOA
High-resolution non-emissive displays based on electrochromic tungsten oxides(WOx)are crucial for future near-eye virtual/augmented reality interactions,given their impressive attributes such as high environmental stability,ideal outdoor readability,and low energy consumption.However,the limited intrinsic structure of inorganic materials has presented a significant challenge in achieving precise patterning/pixelation at the micron scale.Here,we successfully developed the direct photolithography for WOx nanoparticles based on in situ photo-induced ligand exchange.This strategy enabled us to achieve ultra-high resolution efficiently(line width<4μm,the best resolution for reported inorganic electrochromic materials).Additionally,the resulting device exhibited impressive electrochromic performance,such as fast response(<1 s at 0 V),high coloration efficiency(119.5 cm^(2) C^(−1)),good optical modulation(55.9%),and durability(>3600 cycles),as well as promising applications in electronic logos,pixelated displays,flexible electronics,etc.The success and advancements presented here are expected to inspire and accelerate research and development(R&D)in high-resolution non-emissive displays and other ultra-fine micro-electronics.
Chang Gu;Guojian Yang;Wenxuan Wang;Aiyan Shi;Wenjuan Fang;Lei Qian;Xiaofei Hu;Ting Zhang;Chaoyu Xiang;Yu‑Mo Zhang
Laboratory of Optoelectronic Information Technology and Devices,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences,Ningbo 315201,People’s Republic of China Hangzhou Bay Laboratory of Advanced Nano‑Optoelectronic Materials and Devices,Qianwan Institute of CNITECH,Ningbo 315336,People’s Republic of ChinaLaboratory of Optoelectronic Information Technology and Devices,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences,Ningbo 315201,People’s Republic of China Smart Materials for Architecture Research Lab,Innovation Center of Yangtze River Delta,Zhejiang University,Jiaxing 314100,People’s Republic of ChinaLaboratory of Optoelectronic Information Technology and Devices,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences,Ningbo 315201,People’s Republic of China University of Science and Technology of China,Hefei 230026,People’s Republic of ChinaLaboratory of Optoelectronic Information Technology and Devices,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences,Ningbo 315201,People’s Republic of China Smart Materials for Architecture Research Lab,Innovation Center of Yangtze River Delta,Zhejiang University,Jiaxing 314100,People’s Republic of ChinaLaboratory of Optoelectronic Information Technology and Devices,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences,Ningbo 315201,People’s Republic of China Hangzhou Bay Laboratory of Advanced Nano‑Optoelectronic Materials and Devices,Qianwan Institute of CNITECH,Ningbo 315336,People’s Republic of ChinaLaboratory of Optoelectronic Information Technology and Devices,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences,Ningbo 315201,People’s Republic of China Hangzhou Bay Laboratory of Advanced Nano‑Optoelectronic Materials and Devices,Qianwan Institute of CNITECH,Ningbo 315336,People’s Republic of ChinaLaboratory of Optoelectronic Information Technology and Devices,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences,Ningbo 315201,People’s Republic of China Hangzhou Bay Laboratory of Advanced Nano‑Optoelectronic Materials and Devices,Qianwan Institute of CNITECH,Ningbo 315336,People’s Republic of ChinaLaboratory of Optoelectronic Information Technology and Devices,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences,Ningbo 315201,People’s Republic of China Hangzhou Bay Laboratory of Advanced Nano‑Optoelectronic Materials and Devices,Qianwan Institute of CNITECH,Ningbo 315336,People’s Republic of ChinaLaboratory of Optoelectronic Information Technology and Devices,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences,Ningbo 315201,People’s Republic of China Hangzhou Bay Laboratory of Advanced Nano‑Optoelectronic Materials and Devices,Qianwan Institute of CNITECH,Ningbo 315336,People’s Republic of ChinaState Key Lab of Supramolecular Structure and Materials,College of Chemistry,Jilin University,Changchun 130012,People’s Republic of China
化学
ElectrochromicDirect photolithographyWOx nanoparticlesIn situ photo-induced ligand exchangeHigh-resolution displays
《Nano-Micro Letters》 2025 (3)
P.297-309,13
supported by the National Key R&D Program of China(2022YFB3606501,2022YFB3602902)the Key projects of National Natural Science Foundation of China(62234004)the National Natural Science Foundation of China(U23A2092)Pioneer and Leading Goose R&D Program of Zhejiang(2024C01191,2024C01092)Innovation and Entrepreneurship Team of Zhejiang Province(2021R01003)Ningbo Key Technologies R&D Program(2022Z085),Ningbo 3315 Programme(2020A-01-B)YONGJIANG Talent Introduction Programme(2021A-038-B,2021A-159-G)“Innovation Yongjiang 2035”Key R&D Programme(2024Z146)Ningbo JiangBei District public welfare science and technology project(2022C07)the China National Postdoctoral Program for Innovative Talents(grant no.BX20240391)the China Postdoctoral Science Foundation(grant no.2023M743623).
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