光学精密工程2024，Vol.32Issue(21)：3147-3156,10.DOI:10.37188/OPE.20243221.3147
一维亚波长红外偏振光栅全息光刻加工
Holographic lithography of one-dimensional subwavelength infrared polarization gratings
摘要
Abstract
Subwavelength gratings,as compact,easily integrable polarization-selective devices with high extinction ratios,hold significant potential for applications in remote sensing,material stress detection,an-ti-scattering imaging,and related fields,garnering widespread attention.In this study,we design a one-di-mensional subwavelength grating polarization-selective device with high extinction ratios and high transmit-tance,along with an efficient fabrication method.Utilizing the effective medium theory and finite-differ-ence time-domain simulations,we developed and modeled a one-dimensional subwavelength grating de-vice featuring a double-layer metal structure optimized for holographic interference processing.This design offers robust duty cycle tolerance and facilitates the direct transfer of photoresist patterns.A holographic la-ser lithography system was constructed to fabricate one-dimensional gratings with dimensions of 30 mm×30 mm and a period of 800 nm.Compared to conventional techniques,this approach demonstrates signifi-cant advantages in processing efficiency,cost-effectiveness,and tunable periodicity.The transfer of photo-resist patterns to metal gratings was achieved via silicon substrate etching and metal film deposition.The resulting gratings exhibit an average transmittance exceeding 45%and a maximum extinction ratio of 30 dB for infrared wavelengths in the range of 3-15 μm.关键词
全息光刻/双层金属光栅/亚波长光栅/偏振选择Key words
hololithography/double-layer metal gratin/subwavelength grating/polarization selection分类
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陆天石,邓富元,李星辉..一维亚波长红外偏振光栅全息光刻加工[J].光学精密工程,2024,32(21):3147-3156,10.基金项目
广东省基础与应用基础研究基金资助项目(No.2021B1515120007) （No.2021B1515120007）
