光通信技术2025，Vol.49Issue(1)：94-100,7.DOI:10.13921/j.cnki.issn1002-5561.2025.01.016
基于椭偏光谱和光杠杆法的薄膜厚度及曲率测量系统设计
Design of film thickness and curvature measurement system based on ellipsometry spectrum and optical lever method
孙伟 1金尚忠 1张殷 2孙紫娟 2徐胜2
作者信息
- 1. 中国计量大学光学与电子科技学院,杭州 310018
- 2. 苏州岚创科技有限公司,江苏苏州 215004
- 折叠
摘要
Abstract
In the dense wavelength division multiplexing system,when adjusting the process using a narrowband filter,it is neces-sary to measure the thickness,thickness distribution,and residual stress of a single layer of film.To solve the complexity and re-peated positioning errors introduced by the need to use multiple systems for measurement,a measurement system based on ellip-sometry spectrum and the optical lever method is introduced,which successfully achieved precise measurement of these parame-ters on a single integrated device.The experimental results show that the thickness deviation measured by the designed measure-ment system is less than 0.21％,the thickness distribution deviation is less than 0.025％,the curvature and the residual stress devi-ation is within±1 °.The system can meet the actual measurement needs.关键词
光学检测/椭偏光谱/光杠杆法/基片曲率法/残余应力Key words
optical inspection/ellipsometry spectrum/optical lever method/substrate curvature method/residual stress分类
信息技术与安全科学引用本文复制引用
孙伟,金尚忠,张殷,孙紫娟,徐胜..基于椭偏光谱和光杠杆法的薄膜厚度及曲率测量系统设计[J].光通信技术,2025,49(1):94-100,7.
