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共源共栅结构GaN HEMT器件高能质子辐射效应

邱一武 董磊 殷亚楠 周昕杰

强激光与粒子束2025,Vol.37Issue(2):122-129,8.
强激光与粒子束2025,Vol.37Issue(2):122-129,8.DOI:10.11884/HPLPB202537.240223

共源共栅结构GaN HEMT器件高能质子辐射效应

High-energy proton irradiation effect of Cascode structure GaN HEMT device

邱一武 1董磊 1殷亚楠 1周昕杰1

作者信息

  • 1. 中国电子科技集团公司第五十八研究所,江苏 无锡 214035
  • 折叠

摘要

Abstract

Due to the comprehensive performance advantages,GaN-based power devices are more suitable for the future development needs of RF power amplifier modules in the space equipment such as satellite electronic systems.Therefore,the degradation of electrical characteristics and damage mechanism of the enhancement-mode Cascode structure GaN HEMT devices were studied by irradiation experiments with 5 MeV,60 MeV and 300 MeV protons at the irradiation dose of 2×1012~1×1014 cm-2.The experimental results show that when the irradiation dose is 2×1012 cm-2,the threshold voltage of the Cascode structure GaN HEMT device is significantly reduced,the transconductance peak is negatively drifted and the peak transconductance is reduced,the saturated drain current is significantly increased,and the gate leakage current has no significant change.When the irradiation dose reaches 1×1013 cm-2,the degradation of electrical properties is inhibited and tends to saturate.It is concluded that the cascaded silicon MOSFET in the Cascode structure GaN HEMT is the internal cause of threshold voltage negative drift and drain current increase after proton irradiation.Combined with low-frequency noise test analysis,it is found that the higher the proton irradiation dose,the larger the noise power spectral density of the device,indicating that the more defects introduced by irradiation,the more serious the irradiation damage.Compared with the results of 60 MeV and 300 MeV proton irradiation,the degradation of electrical characteristics of the device after 5 MeV proton irradiation is the most serious.SRIM simulation results show that the lower the proton irradiation energy,the greater the number of vacancies(gallium vacancy is dominated),and the more significant the degradation of electrical characteristics of the device.

关键词

增强型GaN HEMT器件/质子辐照/电学特性/低频噪声/SRIM仿真

Key words

enhancement-mode GaN HEMT/proton-irradiation/electrical characteristics/low frequency noise/SRIM simulation

分类

信息技术与安全科学

引用本文复制引用

邱一武,董磊,殷亚楠,周昕杰..共源共栅结构GaN HEMT器件高能质子辐射效应[J].强激光与粒子束,2025,37(2):122-129,8.

基金项目

抗辐照应用技术创新中心创新基金项目(KFZC2021010202) (KFZC2021010202)

强激光与粒子束

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