| 注册
首页|期刊导航|物理学报|激光锡等离子体的状态参数分布和极紫外波段辐射的模拟研究

激光锡等离子体的状态参数分布和极紫外波段辐射的模拟研究

敏琦 王国栋 何朝伟 何思奇 卢海东 刘兴邦 武艳红 苏茂根 董晨钟

物理学报2025,Vol.74Issue(3):30-44,15.
物理学报2025,Vol.74Issue(3):30-44,15.DOI:10.7498/aps.74.20241321

激光锡等离子体的状态参数分布和极紫外波段辐射的模拟研究

Numerical simulation of state parameter distributions and extreme ultraviolet radiation in laser-produced tin plasma

敏琦 1王国栋 1何朝伟 1何思奇 2卢海东 1刘兴邦 1武艳红 1苏茂根 1董晨钟1

作者信息

  • 1. 西北师范大学物理与电子工程学院,甘肃省原子分子物理与功能材料重点实验室,兰州 730070
  • 2. 兰州工业学院计算机与人工智能学院,兰州 730050
  • 折叠

摘要

Abstract

The laser-produced Sn plasma light source is a critical component in advanced extreme ultraviolet(EUV)lithography.The power and stability of EUV radiation within a 2%bandwidth centered at 13.5 nm are key indicators that determine success of the entire lithography process.The plasma state parameter distributions and the EUV radiation spectrum for a laser-produced Sn plasma light source are numerically simulated in this work.The radiative opacity of Sn plasma within the 12-16 nm range is calculated using a detailed-level-accounting model in the local thermodynamic equilibrium approximation.Next,the temperature distribution and the electron density distribution of plasma generated by nanosecond laser pulses interacting with both a Sn planar solid target and a liquid droplet target are simulated using the radiation hydrodynamics code for laser-produced plasma,RHDLPP.By combining the radiative opacity data with the plasma state data,the spectral simulation subroutine SpeIma3D is employed to model the spatially resolved EUV spectra for the planar target plasma and the angle-resolved EUV spectra for the droplet target plasma at a 60-degree observation angle.The variation of in-band radiation intensity at 13.5 nm within the 2%bandwidth as a function of observation angle is also analyzed for the droplet-target plasma.The simulated plasma state parameter distributions and EUV spectral results closely match existing experimental data,demonstrating the ability of RHDLPP code to model laser-produced Sn plasma EUV light sources.These findings provide valuable support for the development of EUV lithography and EUV light sources.

关键词

极紫外光刻光源/激光锡等离子体/辐射流体力学程序/极紫外光谱

Key words

extreme ultraviolet lithography light source/laser-produced tin plasma/radiation hydrodynamics code/extreme ultraviolet spectra

引用本文复制引用

敏琦,王国栋,何朝伟,何思奇,卢海东,刘兴邦,武艳红,苏茂根,董晨钟..激光锡等离子体的状态参数分布和极紫外波段辐射的模拟研究[J].物理学报,2025,74(3):30-44,15.

基金项目

国家自然科学基金(批准号:12474279,12064040,12464036,12374384)和中央引导地方财政专项(批准号:23ZYQA293)资助的课题. Project supported by the National Natural Science Foundation of China(Grant Nos.12474279,12064040,12464036,12374384)and the Central Leading Local Science and Technology Development Fund Projects,China(Grant No.23ZYQA293). (批准号:12474279,12064040,12464036,12374384)

物理学报

OA北大核心

1000-3290

访问量0
|
下载量0
段落导航相关论文