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A warpage-free Si_(3)N_(4) slurry strategy for vat photopolymerization

Chi Huang Liya Zheng Zhilin Tian Lei Shi Bin Li

Journal of Advanced Ceramics2025，Vol.14Issue(1)：P.193-204,12.

Journal of Advanced Ceramics2025，Vol.14Issue(1)：P.193-204,12.DOI:10.26599/JAC.2024.9221016

A warpage-free Si_(3)N_(4) slurry strategy for vat photopolymerization

Chi Huang ¹Liya Zheng ¹Zhilin Tian ¹Lei Shi ¹Bin Li¹

作者信息

1. School of Materials,Shenzhen Campus of Sun Yat-sen University,Shenzhen 518107,China
折叠

摘要

关键词

three-dimensional(3D)printing/vat photopolymerization/Si_(3)N_(4)/warpage/mechanical properties

分类

信息技术与安全科学

引用本文复制引用

Chi Huang,Liya Zheng,Zhilin Tian,Lei Shi,Bin Li..A warpage-free Si_(3)N_(4) slurry strategy for vat photopolymerization[J].Journal of Advanced Ceramics,2025,14(1):P.193-204,12.

基金项目

financially supported by the Leading Talent Project of the National Special Support Program(No.2022WRLJ003) （No.2022WRLJ003）

the National Natural Science Foundation of China(No.52202126) （No.52202126）

Guangdong Basic and Applied Basic Research Foundation(No.2021B1515020083) （No.2021B1515020083）

Shenzhen Science and Technology Program(Nos.202206193000001 and 20220818183014003). （Nos.202206193000001 and 20220818183014003）

Journal of Advanced Ceramics

ISSN：2226-4108

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