首页|期刊导航|Journal of Advanced Ceramics|Novel transparent high-entropy sesquioxide ceramics with high physicochemical plasma etching resistance

Novel transparent high-entropy sesquioxide ceramics with high physicochemical plasma etching resistance

Yu-Bin Shin Su Been Ham Ha-Neul Kim Mi-Ju Kim Jae-Woong Ko Jae-Wook Lee Young-Jo Park Jung-Hyung Kim Hyo-Chang Lee Young Hwa Jung Jung Woo Lee Ho Jin Ma

Journal of Advanced Ceramics2025，Vol.14Issue(1)：P.163-176,14.

Journal of Advanced Ceramics2025，Vol.14Issue(1)：P.163-176,14.DOI:10.26599/JAC.2024.9221013

Novel transparent high-entropy sesquioxide ceramics with high physicochemical plasma etching resistance

Yu-Bin Shin ¹Su Been Ham ¹Ha-Neul Kim ²Mi-Ju Kim ²Jae-Woong Ko ²Jae-Wook Lee ²Young-Jo Park ²Jung-Hyung Kim ³Hyo-Chang Lee ⁴Young Hwa Jung ⁵Jung Woo Lee ⁶Ho Jin Ma²

作者信息

1. Nano Materials Research Division,Korea Institute of Materials Science,Changwon 51508,Republic of Korea Department of Materials Science and Engineering,Pusan National University,Pusan 46241,Republic of Korea
2. Nano Materials Research Division,Korea Institute of Materials Science,Changwon 51508,Republic of Korea
3. Semiconductor Integrated Metrology Team,Korea Research Institute of Standards and Science,Daejeon 34113,Republic of Korea
4. Department of semiconductor Science,Engineering and Technology,Korea Aerospace University,Goyang 10540,Republic of Korea School of Electronics and Information Engineering,Korea Aerospace University,Goyang 10540,Republic of Korea
5. PLS-II Beamline Division,Pohang Accelerator Laboratory,Pohang 37673,Republic of Korea
6. Department of Materials Science and Engineering,Pusan National University,Pusan 46241,Republic of Korea
折叠

摘要

关键词

high-entropy ceramics/plasma etching resistance/transparent ceramics/sintering/semiconductor manufacturing

分类

化学化工

引用本文复制引用

Yu-Bin Shin,Su Been Ham,Ha-Neul Kim,Mi-Ju Kim,Jae-Woong Ko,Jae-Wook Lee,Young-Jo Park,Jung-Hyung Kim,Hyo-Chang Lee,Young Hwa Jung,Jung Woo Lee,Ho Jin Ma..Novel transparent high-entropy sesquioxide ceramics with high physicochemical plasma etching resistance[J].Journal of Advanced Ceramics,2025,14(1):P.163-176,14.

基金项目

supported by the Fundamental Research Program (PKC2140)of the Korea Institute of Materials Science(KIMS)。（PKC2140）

Journal of Advanced Ceramics

ISSN：2226-4108

访问量0

下载量0

段落导航