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Light and matter co-confined multi-photon lithography:an innovative way to break through the limits of traditional lithography

Jingyu Wang Zhanfeng Guo Zhu Wang Zhengwei Liu Daixuan Wu He Tian

半导体学报（英文版）2025，Vol.46Issue(3)：1-5,5.

Light and matter co-confined multi-photon lithography:an innovative way to break through the limits of traditional lithography

Jingyu Wang ¹Zhanfeng Guo ¹Zhu Wang ²Zhengwei Liu ²Daixuan Wu ¹He Tian¹

作者信息

1. School of Integrated Circuits&Beijing National Research Center for Information Science and Technology(BNRist),Tsinghua University,Beijing 100084,China
2. Jiangsu Fengbo Equipment Technology Co.,Ltd,Wuxi 214000,China
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摘要

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Jingyu Wang,Zhanfeng Guo,Zhu Wang,Zhengwei Liu,Daixuan Wu,He Tian..Light and matter co-confined multi-photon lithography:an innovative way to break through the limits of traditional lithography[J].半导体学报（英文版）,2025,46(3):1-5,5.

基金项目

This work was supported by Xishan-Tsinghua University Industry University Research Deep Integration Special Project,by Beijing Natural Science Foundation-Xiaomi Innovation Joint Fund(Grant No.L233009),by National Natural Science Foundation of China under Grant No.62374099. （Grant No.L233009）

半导体学报（英文版）

ISSN：1674-4926

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