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Hard X-ray resonant reflectivity studies of ultrathin WS2 layers grown by pulsed laser deposition

Sergey M.Suturin Polina A.Dvortsova Alexander M.Korovin Vladimir V.Fedorov Evgeniya Yu.Lobanova Nikolai S.Sokolov

半导体学报（英文版）2025，Vol.46Issue(3)：113-120,8.

Hard X-ray resonant reflectivity studies of ultrathin WS2 layers grown by pulsed laser deposition

Sergey M.Suturin ¹Polina A.Dvortsova ¹Alexander M.Korovin ¹Vladimir V.Fedorov ²Evgeniya Yu.Lobanova ¹Nikolai S.Sokolov¹

作者信息

1. ITMO University,49 Kronverksky prospekt,197101 St.Petersburg,Russia
2. Alferov University,8/3 Khlopina,194021 St.Petersburg,Russia
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摘要

关键词

transition metal dichalcogenides/epitaxial multilayers/pulsed layer deposition/resonant X-ray reflectivity/non-destruc-tive depth profiling

Key words

transition metal dichalcogenides/epitaxial multilayers/pulsed layer deposition/resonant X-ray reflectivity/non-destruc-tive depth profiling

引用本文复制引用

Sergey M.Suturin,Polina A.Dvortsova,Alexander M.Korovin,Vladimir V.Fedorov,Evgeniya Yu.Lobanova,Nikolai S.Sokolov..Hard X-ray resonant reflectivity studies of ultrathin WS2 layers grown by pulsed laser deposition[J].半导体学报（英文版）,2025,46(3):113-120,8.

基金项目

The study was supported by the Ministry of Science and Higher Education of the Russian Federation(agreement No.075-15-2021-1349).The XRR experiments were carried out along proposal 2023G689 at BL3A beamline of the Photon Fac-tory synchrotron(Tsukuba,Japan).The authors wish to acknowledge the beamline staff at BL3A beamline for valu-able cooperation. （agreement No.075-15-2021-1349）

半导体学报（英文版）

ISSN：1674-4926

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