Journal of Changshu Institute of Technology2025，Vol.39Issue(2)：21-25,5.
原位溶胶-凝胶法制备高折射率紫外光固化纳米压印胶
Fabrication of High Refractive UV-curable Resist for UV-curing Nanoimprint Lithography Based on In-situ Sol-gel Technique
裘俊伦 1胡昕2
作者信息
- 1. 苏州大学 材料与化学化工学部,江苏 苏州 215123||常熟理工学院 材料工程学院,江苏 常熟 215500
- 2. 常熟理工学院 材料工程学院,江苏 常熟 215500
- 折叠
摘要
Abstract
High refractive UV-curable polymers are vital to micro-nano optical devices.Based on an acrylated polytitanoxane oligomer with low hydrolysis rate,we further manage to develop a new method to fabricate a Ti-containing nanoparticle dispersion in organic solvent based on the oligomer via in-situ sol-gel technique.The stable solution(at least 6 months at room temperature)has a refractive index of 1.86.The solution can be both directly used for high refractive films and further used for fabricating high refractive UV nanoimprint resists when mixed with acrylate oligomers.This work opens a door to a simple,time-efficient,cost-effective and environmental friendly method to fabricate high refractive polymers.关键词
高折射率/紫外光固化/纳米压印Key words
high refractive/UV-curable/nanoimprint lithography分类
通用工业技术引用本文复制引用
裘俊伦,胡昕..原位溶胶-凝胶法制备高折射率紫外光固化纳米压印胶[J].Journal of Changshu Institute of Technology,2025,39(2):21-25,5.
