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2英寸Fe掺杂高阻β相氧化镓单晶生长及(010)衬底性质研究

严宇超 王琤 陆昌程 刘莹莹 夏宁 金竹 张辉 杨德仁

人工晶体学报2025,Vol.54Issue(2):197-201,5.
人工晶体学报2025,Vol.54Issue(2):197-201,5.DOI:10.16553/j.cnki.issn1000-985x.20241120.001

2英寸Fe掺杂高阻β相氧化镓单晶生长及(010)衬底性质研究

Growth of 2-Inch Fe-Doped β-Ga2O3 Single Crystal with High Resistance and Properties of(010)Substrates

严宇超 1王琤 2陆昌程 2刘莹莹 2夏宁 2金竹 3张辉 1杨德仁1

作者信息

  • 1. 浙江大学材料科学与工程学院,硅及先进半导体全国重点实验室,杭州 310027||浙江大学杭州国际科创中心先进半导体研究院和浙江省宽禁带功率半导体材料与器件重点实验室,杭州 311200
  • 2. 杭州镓仁半导体有限公司,杭州 311200
  • 3. 浙江大学杭州国际科创中心先进半导体研究院和浙江省宽禁带功率半导体材料与器件重点实验室,杭州 311200
  • 折叠

摘要

Abstract

In this work,large-size Fe-doped β-Ga2O3 single crystals were grown by Czochralski method.High quality 2 inch(1 inch=2.54 cm)(010)substrates were fabricated,and the crystal quality,processing quality and electrical properties of these substrates were studied.The uniform appearance of the substrates under the polarizing strain gauge indicates the absence of twinning,cracks and other macrocopic defects,confirming their good macrocrystalline quality.The full width at half maximum(FWHM)of the X-ray rocking curve of(020)plane for these substrates is less than 29.7″,reflecting good microcrystalline quality.The surface average roughness(Ra)of the substrates is less than 0.240 nm,with a local thickness variation(LTV)less than 1.769 μm,a total thickness variation(TTV)of 5.092 μm,and a warp of 3.132 µm,suggesting superior substrate processing quality.Furthermore,the electrical resistivity of the substrate is~7 × 1011 Ω·cm,facilitating the development of the micro wave and radio frequency devices.

关键词

氧化镓/宽禁带半导体/晶体生长/直拉法/单晶衬底/掺杂

Key words

Ga2O3/wide-bandgap semiconductor/crystal growth/Czochralski method/single crystal substrate/doping

分类

数理科学

引用本文复制引用

严宇超,王琤,陆昌程,刘莹莹,夏宁,金竹,张辉,杨德仁..2英寸Fe掺杂高阻β相氧化镓单晶生长及(010)衬底性质研究[J].人工晶体学报,2025,54(2):197-201,5.

基金项目

浙江省"尖兵""领雁"研发攻关计划(2023C01193) (2023C01193)

中央高校基本科研业务费(226-2022-00200,226-2022-00250) (226-2022-00200,226-2022-00250)

博士后创新人才支持计划(BX20220264) (BX20220264)

国家青年拔尖人才支持计划 ()

杭州市领军型创新创业团队引进培育计划(TD2022012) (TD2022012)

人工晶体学报

OA北大核心

1000-985X

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