液晶与显示2025，Vol.40Issue(3)：393-399,7.DOI:10.37188/CJLCD.2024-0298
基于导电层与取向层的多层减反射膜的设计
Design of anti-reflection multilayer film based on conductive layer and alignment layer
摘要
Abstract
Conductive layer and alignment layer are the most common and important film structures in liquid crystal devices.The two film layers are located between the substrate and the liquid crystal,and the film transmittance decreases due to the refractive index mismatch problem,which reduces the light energy utilization rate of the liquid crystal device.To address this problem,this paper proposes a multi-measurement anti-reflection film design method based on conductive layer and alignment layer,and uses the conductive layer and alignment layer as a link in the film system to achieve high transmittance.First,a physical model of a multilayer anti-reflection film based on conductive layer and alignment layer is constructed.Then,based on this model,the corresponding film structure is theoretically designed to achieve high transmittance of the film.Finally,the influence of the liquid crystal power-on process on the film transmittance is systematically studied.The results show that the transmittance of the designed anti-reflection film remains above 99%in the 500～800 nm band and above 96%in the 400～500 nm band;driving the liquid crystal will cause the film transmittance to decrease.Based on the mixed refractive index of the liquid crystal,the transmittance decrease can be reduced to less than 0.5%.This study will be conducive to the realization of liquid crystal devices with high energy utilization and high stability.关键词
导电层/取向层/减反射膜Key words
conductive layer/alignment layer/anti-reflection分类
物理学引用本文复制引用
刁志辉,赵慧茹,彭增辉,刘永刚,穆全全..基于导电层与取向层的多层减反射膜的设计[J].液晶与显示,2025,40(3):393-399,7.基金项目
国家重点研发计划(No.2021YFB3600300) （No.2021YFB3600300）
长春市国家重点实验室(学科类)重大专项(No.23GZZ07) （学科类）
吉林省全国重点实验室(学科类)重大专项(No.SKL202402022) Supported by National Key R&D Program of China(No.2021YFB3600300) （学科类）
Changchun State Key Laboratory Major Project(No.23GZZ07) （No.23GZZ07）
Jilin State Key Laboratory Major Project(No.SKL202402022) （No.SKL202402022）
