发光学报2025，Vol.46Issue(3)：536-544,9.DOI:10.37188/CJL.20240317
基于N-苯基马来酰亚胺改性的量子点光刻胶制备色转换像素化薄膜
Quantum Dot Photoresists for Pixelated Color Conversion Films Based on N-Phenylmaleimide Modification
摘要
Abstract
Photolithography is a reliable method for fabricating pixelated color conversion films in Micro-LEDs,but it faces challenges related to the compatibility of quantum dots(QDs)with photoresists.This paper develops a quantum dot-compatible photoresist by modifying acrylic resin with N-phenylmaleimide(NPMI)side chains.The C==O bonds on the side chain groups form coordination bonds with quantum dots,passivating surface defects and improving the dispersion of quantum dots.This enhances the photoluminescence quantum yield(PLQY)of the photoresist solution,reaching 76.1%for red and 43.4%for green.Even after fabricating the color conversion films,the passivation effect persists,with PLQY values of 66.4%for green and 36.4%for red.The minimum pixel size achieved was a rectangular array of 10 μm×10 μm.The resin side chain modification approach in this study provides guidance for developing QD-compatible photore-sists and offers a simple and viable solution for the commercialization of full-color Micro-LED applications.关键词
量子点光刻胶/色转换/树脂改性/像素化Key words
quantum dot photoresist/color conversion/resin modification/pixelation分类
数理科学引用本文复制引用
蒋博瑞,宋博翔,陈恩果,罗家俊,唐江..基于N-苯基马来酰亚胺改性的量子点光刻胶制备色转换像素化薄膜[J].发光学报,2025,46(3):536-544,9.基金项目
国家重点研发计划青年科学家项目(2021YFB3501800) （2021YFB3501800）
国家自然科学基金(62322505,62374069,62175032) （62322505,62374069,62175032）
福建省杰出青年基金项目(2024J010046) （2024J010046）
武汉光电国家研究中心开放课题(2023WNLOKF011) Supported by National Key R&D Program of China(2021YFB3501800) （2023WNLOKF011）
National Natural Science Foundation of China(62322505,62374069,62175032) （62322505,62374069,62175032）
Natural Science Foundation for Distinguished Young Scholars of Fujian Province(2024J01512955) （2024J01512955）
Open Project Program of Wuhan National Laboratory of Optoelectronics(2023WNLOKF011) （2023WNLOKF011）
