首页|期刊导航|Nano Materials Science|Recent advances of photolithography patterning of quantum dots for micro-display applications
Nano Materials Science2025,Vol.7Issue(1):P.49-64,16.DOI:10.1016/j.nanoms.2024.03.005
Recent advances of photolithography patterning of quantum dots for micro-display applications
摘要
关键词
Quantum dot/Photolithography/Patterning technology/Micro-display分类
信息技术与安全科学引用本文复制引用
Xuemin Kong,Xiaotong Fan,Yuhui Wang,Yunshu Luo,Yihang Chen,Tingzhu Wu,Zhong Chen,Yue Lin,Shuli Wang..Recent advances of photolithography patterning of quantum dots for micro-display applications[J].Nano Materials Science,2025,7(1):P.49-64,16.基金项目
supported by the National Natural Science Foundation of China(62374142,12175189 and 11904302) (62374142,12175189 and 11904302)
External Cooperation Program of Fujian(2022I0004) (2022I0004)
Fundamental Research Funds for the Central Universities(20720190005 and 20720220085) (20720190005 and 20720220085)
Major Science and Technology Project of Xiamen in China(3502Z20191015). (3502Z20191015)