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Molecular sieves assisted chemical vapor deposition preparation of high-κ dielectric m-ZrO2 nanosheets

Ting Lu Zhuojun Duan Ling Zhang Yuanyuan Jin Huimin Li Song Liu

半导体学报（英文版）2025，Vol.46Issue(4)：99-107,9.

半导体学报（英文版）2025，Vol.46Issue(4)：99-107,9.DOI:10.1088/1674-4926/24090034

Molecular sieves assisted chemical vapor deposition preparation of high-κ dielectric m-ZrO2 nanosheets

Ting Lu ¹Zhuojun Duan ¹Ling Zhang ¹Yuanyuan Jin ²Huimin Li ¹Song Liu³

作者信息

1. College of Chemistry and Chemical Engineering,Hunan University,Changsha 410082,China
2. Department of Applied Physics,The Hong Kong Polytechnic University,Hong Kong 999077,China
3. College of Chemistry and Chemical Engineering,Hunan University,Changsha 410082,China||Shenzhen Research Institute,Hunan University,Shenzhen 518000,China
折叠

摘要

关键词

ZrO2/high-κ gate dielectric/chemical vapor deposition/field effect transistors/molecular sieves

Key words

ZrO2/high-κ gate dielectric/chemical vapor deposition/field effect transistors/molecular sieves

引用本文复制引用

Ting Lu,Zhuojun Duan,Ling Zhang,Yuanyuan Jin,Huimin Li,Song Liu..Molecular sieves assisted chemical vapor deposition preparation of high-κ dielectric m-ZrO2 nanosheets[J].半导体学报（英文版）,2025,46(4):99-107,9.

基金项目

The work gratefully acknowledges financial support from the National Natural Science Foundation of China(No.21975067)and Shenzhen Science and Technology Program(No.JCYJ20220530160407016). （No.21975067）

半导体学报（英文版）

ISSN：1674-4926

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