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多束电子源设计与实验

赵伟霞 白凌超 张利新 刘俊标 殷伯华 韩立

光学精密工程2025,Vol.33Issue(5):741-750,10.
光学精密工程2025,Vol.33Issue(5):741-750,10.DOI:10.37188/OPE.20253305.0741

多束电子源设计与实验

Design and experiment of multi-beam electron source

赵伟霞 1白凌超 2张利新 3刘俊标 1殷伯华 1韩立1

作者信息

  • 1. 中国科学院 电工研究所 微纳加工技术与智能电气设备研究部,北京 100190||中国科学院大学 电子电气与通信工程学院,北京 100049
  • 2. 中国科学院 电工研究所 微纳加工技术与智能电气设备研究部,北京 100190||北京信息科技大学 仪器科学与光电工程学院,北京 100192
  • 3. 中国科学院 电工研究所 微纳加工技术与智能电气设备研究部,北京 100190
  • 折叠

摘要

Abstract

To enhance the throughput of single-beam devices,such as scanning electron microscopes,a multi-beam electron source system utilizing a Schottky gun was developed.This study encompasses the design methodologies and fabrication processes for the collimator lens,aperture array,and micro-arrayed electrostatic lenses.The electrostatic collimator lens was designed based on the emission characteristics of the Schottky cathode,and the performance of the collimated beam was subsequently calculated.Aperture arrays,including configurations of 3×3 and 10×10 for beam splitting,were fabricated utilizing MEMS technology,and a high-precision assembly system was established to enable the assembly of micro-arrayed electrostatic lenses.Experiments concerning beam collimation,splitting,and focusing were conducted on a dedicated multi-beam electron source experimental platform,validating the performance of the 3×3 mul-tibeam electron source.Experimental results indicate that the collimated spot size was measured to be 600 μm with a beam current density of 4.11 A/m² and a uniformity of 6.06%.The average diameter of the fo-cused beamlet is recorded at 5.32 μm,accompanied by size uniformity of 5.91%,intensity uniformity of 4.36%,and pitch uniformity of 3.06%,all of which meet the design criteria of the multi-beam setup.

关键词

电子光学/多束电子源/肖特基发射/准直透镜/微阵列单电位透镜

Key words

electron optics/multi-beam electron source/Schottky emission/collimator lenses/micro-ar-rayed einzel lens

分类

电子信息工程

引用本文复制引用

赵伟霞,白凌超,张利新,刘俊标,殷伯华,韩立..多束电子源设计与实验[J].光学精密工程,2025,33(5):741-750,10.

基金项目

中国科学院科研仪器设备研制项目(No.PTYQ2024BJ0004) (No.PTYQ2024BJ0004)

光学精密工程

OA北大核心

1004-924X

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