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Manipulating Interfacial Stability via Preferential Absorption for Highly Stable and Safe 4.6 V LiCoO2 Cathode

Long Chen Xin He Yiqing Chen Youmin Hou Yujie Zhang Kangli Wang Xinping Ai Yuliang Cao Zhongxue Chen

纳微快报（英文）2025，Vol.17Issue(8)：95-110,16.

纳微快报（英文）2025，Vol.17Issue(8)：95-110,16.DOI:10.1007/s40820-025-01694-4

Manipulating Interfacial Stability via Preferential Absorption for Highly Stable and Safe 4.6 V LiCoO2 Cathode

Long Chen ¹Xin He ²Yiqing Chen ¹Youmin Hou ¹Yujie Zhang ²Kangli Wang ²Xinping Ai ³Yuliang Cao ³Zhongxue Chen¹

作者信息

1. Key Laboratory of Hydraulic Machinery Transients,Ministry of Education,School of Power and Mechanical Engineering,Wuhan University,Wuhan 430072,People's Republic of China
2. State Key Laboratory of Advanced Electromagnetic Technology,School of Electrical and Electronic Engineering,Huazhong University of Science and Technology,Wuhan 430074,People's Republic of China
3. Hubei Key Laboratory of Electrochemical Power Sources,College of Chemistry and Molecular Sciences,Wuhan University,Wuhan 430072,People's Republic of China
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摘要

关键词

Electrolyte design/LiF-rich interface/Wide-temperature/High-safe/4.6 V LCO

Key words

Electrolyte design/LiF-rich interface/Wide-temperature/High-safe/4.6 V LCO

引用本文复制引用

Long Chen,Xin He,Yiqing Chen,Youmin Hou,Yujie Zhang,Kangli Wang,Xinping Ai,Yuliang Cao,Zhongxue Chen..Manipulating Interfacial Stability via Preferential Absorption for Highly Stable and Safe 4.6 V LiCoO2 Cathode[J].纳微快报（英文）,2025,17(8):95-110,16.

基金项目

This work was financially supported by National Key Research and Development Program of China(2024YFE0213000),National Natural Science Foundation of China(No.U22A20438),Hubei Natural Science Founda-tion(2023BAB036,2024BAB103)and the Key Research and Development Program of Ningxia Hui Autonomous Region(2024BEE02002).We wish to thank the Supercomputing Center for the calculation assistance,Core Facility of Wuhan University and Core Research Facilities of College of Chemistry and Molecu-lar Sciences of Wuhan University for instrument tests and TEM characterization(Talos F200X).We also wish to thank Mr.Binbin Shuai from Shiyanjia Lab(www.shiyanjia.com)for the XPS assis-tance.Finally,we want to extend gratitude for Mr.Hao Zhang from Peking University for the improvement of the conception. （2024YFE0213000）

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ISSN：2311-6706

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