化工学报2025，Vol.76Issue(4)：1820-1830,11.DOI:10.11949/0438-1157.20241135
丙烯酸配位有机锡光刻胶的制备及高分辨光刻研究
Preparation and high-resolution lithography study of organic tin photoresists containing acrylates
摘要
Abstract
The rapid advancements in lithography within the integrated circuit industry have necessitated enhanced performance from photoresists.Organic-tin complexes show excellent properties in lithography resolution and line edge roughness,but their lithography sensitivity and film stability are relatively poor.This study presents an acrylic-coordinated triphenyl-tin carboxylate photoresist,designated as Sn1Ac,which is suitable for both deep-ultraviolet and electron-beam lithography applications.By forming hydrogen bonds with the additive tetrakis(3-mercaptopropionic acid)pentaerythritol ester,the instability of spin-coated films has been effectively eliminated,resulting in a photolithography film retention rate exceeding 93%.The hybrid films demonstrate excellent negative patterning properties.Under electron-beam lithography,these hybrid films achieve a resolution better than 15 nm and a line edge roughness of less than 2 nm.Through X-ray photoelectron spectroscopy and other testing methods,this paper proposed the synergistic cross-linking exposure mechanism of tin-carbonate and thiol-ene click reactions.关键词
光刻胶/旋涂/表面/配合物/纳米材料/光响应材料Key words
photoresist/spin-coating/surface/complexes/nanomaterials/photo-responsive materials分类
化学化工引用本文复制引用
赵英东,姬沛君,丛日尧,付海超,张家龙,陈鹏忠,彭孝军..丙烯酸配位有机锡光刻胶的制备及高分辨光刻研究[J].化工学报,2025,76(4):1820-1830,11.基金项目
国家自然科学基金项目(22378052,22090011) （22378052,22090011）
山东省重点研发(重大科技创新工程)项目(2021CXGC010308) （重大科技创新工程）
