真空电子技术Issue(2)：41-46,6.DOI:10.16540/j.cnki.cn11-2485/tn.2025.02.09
磁控溅射Cr薄膜对95％Al2O3陶瓷二次电子发射系数和沿面闪络特性的影响
Effects of Magnetron Sputtering Cr Film on Secondary Electron Emission Coefficient and Surface Flashover Characteristics of 95％Al2O3 Ceramic
摘要
Abstract
Cr films with different thicknesses are deposited on 95％Al2O3 ceramic substrate by magnetron sputtering.The oxidation of Cr layer and its reaction with the substrate at high temperature are studied by chan-ging heat treatment conditions.X-ray photoelectron spectroscopy(XPS),scanning electron microscopy(SEM),and X-ray diffraction analysis(XRD)are used to analyze the changes in the oxidation valence state of Cr and the reaction between the oxide film and the Al2O3 substrate.The results show that when the heat treatment temperature is 1 300 ℃,the surface oxide layer is all of Cr2 O3;when the heat treatment temperature is 1 400 ℃and above,Cr2O3 is solidly dissolved in Al2O3 unit cell.The secondary electron emission coefficient(SEE)and surface flashover voltage of Al2O3 after surface treatment are tested,and the influence of the film on the SEE of Al2O3 ceramics is studied.The results show that as the heat treatment temperature increases,the SEE of coated alumina ceramics decreases;when the heat treatment temperature is 1 400 ℃,the surface flashover voltage rea-ches the maximum value.关键词
氧化铝陶瓷/磁控溅射/XPS/SEE/真空沿面闪络Key words
Alumina ceramics/Magnetron sputtering/XPS/SEE/Surface flashover分类
电子信息工程引用本文复制引用
王箫婧,冯丹丹,韩雪莹,于志强..磁控溅射Cr薄膜对95％Al2O3陶瓷二次电子发射系数和沿面闪络特性的影响[J].真空电子技术,2025,(2):41-46,6.
