红外技术2025，Vol.47Issue(6)：696-703,8.
微米级数字光刻微缩投影物镜设计
Design of Micron Scale Digital Lithography Miniature Projection Objective
摘要
Abstract
Micron-scale chips are widely used in large-scale industrial production because of their low cost and mature technology.However,in the manufacturing field,design studies on digital lithography projection objective lenses with micron-level resolution are relatively few.In this paper,a digital lithography micro-projection objective lens with micron resolution was designed using ZEMAX.For the commonly used 405 nm lithography light source,the system achieves a resolution of 0.625 μm,enabling more precise structural processing.The imaging distortion is reduced to 0.0159％,significantly improving overall image quality.The designed objective lens has a magnification of-0.0714 and a numerical aperture of 0.02,meeting the requirements for most micron-scale chip manufacturing processes.Additionally,a microlens array was designed to ensure uniform illumination,minimizing the effects of uneven lighting.Tolerance analysis shows that 90％of the manufactured lenses achieve an MTF greater than 0.7692,satisfying machining accuracy requirements.关键词
微米级芯片/数字光刻/ZEMAX/微透镜阵列/匀光Key words
micron scale chip/digital lithography/ZEMAX/microlens array/uniform light分类
电子信息工程引用本文复制引用
杨嘉根,郝博楷,万林峰,王双保,徐智谋,张学明..微米级数字光刻微缩投影物镜设计[J].红外技术,2025,47(6):696-703,8.基金项目
湖北省重点研发计划项目资助(2022BBA0074) （2022BBA0074）
湖北省级应用光学一流课程建设项目(2022-65). （2022-65）
