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Progress and trends of low-jitter fractional-N PLL

Jun Yin Haoran Li Xiaoqi Lin Rui P.Martins Pui-In Mak

半导体学报（英文版）2025，Vol.46Issue(7)：8-11,4.

半导体学报（英文版）2025，Vol.46Issue(7)：8-11,4.DOI:10.1088/1674-4926/25040035

Progress and trends of low-jitter fractional-N PLL

Jun Yin ¹Haoran Li ¹Xiaoqi Lin ¹Rui P.Martins ²Pui-In Mak¹

作者信息

1. Institute of Microelectronics,University of Macau,Macao,China
2. Institute of Microelectronics,University of Macau,Macao,China||On leave from the Instituto Superior Técnico,Universidade de Lisboa,Lisbon,1049-001,Portugal
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Jun Yin,Haoran Li,Xiaoqi Lin,Rui P.Martins,Pui-In Mak..Progress and trends of low-jitter fractional-N PLL[J].半导体学报（英文版）,2025,46(7):8-11,4.

基金项目

This work is supported by the University of Macau Research Fund under Grant MYRG-GRG2024-00298-IME and by the Macao Science and Technology Development Fund(FDCT)under Grant 0103/2022/AFJ. （FDCT）

半导体学报（英文版）

ISSN：1674-4926

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