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Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography

Junlong Li Chaoxing Wu Yanmin Guo Kun Wang Wei Huang Hao Su Wenhao Li Xiongtu Zhou Yongai Zhang Tailiang Guo

纳微快报（英文）2025，Vol.17Issue(10)：49-62,14.

纳微快报（英文）2025，Vol.17Issue(10)：49-62,14.DOI:10.1007/s40820-025-01737-w

Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography

Junlong Li ¹Chaoxing Wu ²Yanmin Guo ¹Kun Wang ¹Wei Huang ¹Hao Su ¹Wenhao Li ¹Xiongtu Zhou ²Yongai Zhang ²Tailiang Guo²

作者信息

1. College of Physics and Information Engineering,Fuzhou University,Fuzhou 350108,People's Republic of China
2. College of Physics and Information Engineering,Fuzhou University,Fuzhou 350108,People's Republic of China||Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China,Fuzhou 350108,People's Republic of China
折叠

摘要

关键词

Submicron light source/Quantum dot/Photoluminescence/Photolithography/Shadow-assisted sidewall emission

Key words

Submicron light source/Quantum dot/Photoluminescence/Photolithography/Shadow-assisted sidewall emission

引用本文复制引用

Junlong Li,Chaoxing Wu,Yanmin Guo,Kun Wang,Wei Huang,Hao Su,Wenhao Li,Xiongtu Zhou,Yongai Zhang,Tailiang Guo..Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography[J].纳微快报（英文）,2025,17(10):49-62,14.

基金项目

This research was supported by Natural Sci-ence Foundation of the Fujian Province,China(2024J010016),the National Key R&D Program of China(2021YFB3600400),Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China Project(2020ZZ113,2021ZZ130). （2024J010016）

纳微快报（英文）

ISSN：2311-6706

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