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首页|期刊导航|半导体学报(英文版)|A 0.1-5.1 GHz high-gain LNA with inductorless composite resistor-capacitor feedback structure based on a 0.25 μm SiGe BiCMOS process

A 0.1-5.1 GHz high-gain LNA with inductorless composite resistor-capacitor feedback structure based on a 0.25 μm SiGe BiCMOS process

Zhouhao Zhao Qian Chen Yixing Lu Haigang Feng

半导体学报(英文版)2025,Vol.46Issue(8):36-44,9.
半导体学报(英文版)2025,Vol.46Issue(8):36-44,9.DOI:10.1088/1674-4926/24110028

A 0.1-5.1 GHz high-gain LNA with inductorless composite resistor-capacitor feedback structure based on a 0.25 μm SiGe BiCMOS process

A 0.1-5.1 GHz high-gain LNA with inductorless composite resistor-capacitor feedback structure based on a 0.25 μm SiGe BiCMOS process

Zhouhao Zhao 1Qian Chen 1Yixing Lu 1Haigang Feng1

作者信息

  • 1. Tsinghua Shenzhen International Graduate School,Tsinghua University,Shenzhen 518055,China
  • 折叠

摘要

关键词

SiGe BiCMOS/low noise amplifier/wideband/inductorless/integrated circuits

Key words

SiGe BiCMOS/low noise amplifier/wideband/inductorless/integrated circuits

引用本文复制引用

Zhouhao Zhao,Qian Chen,Yixing Lu,Haigang Feng..A 0.1-5.1 GHz high-gain LNA with inductorless composite resistor-capacitor feedback structure based on a 0.25 μm SiGe BiCMOS process[J].半导体学报(英文版),2025,46(8):36-44,9.

基金项目

This work is funded by the Science,Technology and Innovation Commission of Shenzhen Municipality(JCYJ20220818101001003).The authors would also appreci-ate Lorentz Solution for providing a great EM simulation tool"peakview"to analyze the performance of the devices. (JCYJ20220818101001003)

半导体学报(英文版)

1674-4926

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