航空材料学报2025，Vol.45Issue(4)：37-44,8.DOI:10.11868/j.issn.1005-5053.2025.000060
Al2O3薄膜制备工艺对高温阻挡性能的影响
Effect of preparation process of aluminum oxide thin films on high temperature barrier performance
刘鹏瑞 1鲍天骄 1张桐 1张亚发 1王浩森1
作者信息
- 1. 中国航发北京航空材料研究院隐身材料重点实验室,北京 100095
- 折叠
摘要
Abstract
With the rapid development of detection technology,the demand for infrared stealth performance in weapons and equipment is increasing,especially the urgent need to suppress the infrared radiation signal of high-temperature components.Pt metal films have ultra-low infrared emissivity,However,due to the diffusion of metal films with matrix elements at high temperatures,the infrared emissivity increases significantly.Therefore,it is necessary to prepare a barrier layer with high temperature stability.An alumina thin film barrier layer is prepared using magnetron sputtering and electron beam vapor deposition processes,respectively.The microstructure,phase composition of alumina thin films prepared by different processes and variation of emissivity after magnetron sputtering Pt coating on alumina thin films are studied by SEM and XRD.The results indicate that the alumina films prepared by electron beam vapor deposition process have a stable crystal structure.After surface coating with Pt metal film,the initial infrared emissivity of the film is 0.16.After high-temperature treatment at 900℃for 20 h,the infrared emissivity is 0.172.It has good high-temperature resistance and is expected to be applied as a barrier layer for high-temperature and low infrared emissivity films.关键词
Al2O3薄膜/电子束气相沉积/磁控溅射/红外发射率/阻挡层Key words
alumina thin film/electron beam vapor deposition/magnetron sputtering/infrared emissivity/barrier layer分类
军事科技引用本文复制引用
刘鹏瑞,鲍天骄,张桐,张亚发,王浩森..Al2O3薄膜制备工艺对高温阻挡性能的影响[J].航空材料学报,2025,45(4):37-44,8.
