液晶与显示2025，Vol.40Issue(8)：1100-1114,15.DOI:10.37188/CJLCD.2025-0074
低温多晶硅氧化物显示驱动技术及氢扩散行为的研究进展
Review of low-temperature polycrystalline silicon oxide display driving technology and hydrogen diffusion behavior
摘要
Abstract
Low temperature polycrystalline oxide(LTPO)display technology is a new integrated display technology that integrates low temperature polycrystalline silicon(LTPS)and metal oxide semiconductors(MOS)to achieve high performance and low power consumption display solutions.During the LTPO integration process,hydrogen may diffuse from the low-temperature polysilicon layer to the metal oxide layer,resulting in device threshold voltage drift and deterioration of stability,affecting display product performance.The differences of hydrogen in LTPS and MOS devices and the effects of hydrogen on MOS devices are discussed in detail.Two types of hydrogen blocking methods for MOS devices are summarized:using different dielectric layers and ion doping technology.In addition,the paper also arranges the hydrogen barrier for LTPO devices to improve the stability and reliability of LTPO devices.Finally,the wider application of LTPO technology in the field of high performance display through hydrogen blocking is prospected.关键词
低温多晶硅氧化物/金属氧化物/低温多晶硅/薄膜晶体管/氢扩散Key words
LTPO/metal oxide/low temperature polysilicon/TFT/hydrogen diffusion分类
信息技术与安全科学引用本文复制引用
张西,喻志农,刘斌,张硕,温丛阳,姚琪,郭建,宁策,袁广才,王峰..低温多晶硅氧化物显示驱动技术及氢扩散行为的研究进展[J].液晶与显示,2025,40(8):1100-1114,15.基金项目
国家重点研发计划(No.2021YFB3600703)Supported by National Key Research and Development Program of China(No.2021YFB3600703) （No.2021YFB3600703）
