表面技术2025，Vol.54Issue(20)：124-134,11.DOI:10.16490/j.cnki.issn.1001-3660.2025.20.009
Ta含量对CrTaN涂层微观结构与耐腐蚀性能的影响
Effect of Ta Content on Microstructure and Corrosion Resistance of CrTaN Coating
摘要
Abstract
The growing demand for durable and corrosion-resistant materials in defense system applications has driven the development of advanced coating technologies.Among these,CrTaN coatings have emerged as promising candidates due to their superior mechanical properties and corrosion resistance.This study focuses on investigating the influence of tantalum(Ta)content on the microstructural evolution and corrosion behaviors of CrTaN coatings deposited on gun steel substrates,with the aim of optimizing their performance in challenging environments.The CrTaN coatings were deposited by magnetron sputtering with precisely controlled Ta composition ranging from 1.12at.％to 6.1at.％.The microstructural morphology and corrosion resistance assessment of the coatings were characterized through X-ray diffraction(XRD),scanning electron microscopy(SEM),energy-dispersive spectroscopy(EDS),and electrochemical workstation analysis.The surface morphological analysis revealed that all coatings exhibited compact,uniform,and defect-free surfaces,with distinct evolutionary patterns observed as Ta content increased.The CrN coating showed a typical cauliflower-like structure,which retained in the CrTaN coatings with 1.12at.％Ta content.With the increase of Ta content,the surface morphology gradually evolved a triangular pyramidal shape at 6.1at.％Ta content.The cross-sectional characterization revealed excellent coating uniformity and good adhesion,with a continuous columnar crystal structure throughout the coating thickness.At lower Ta content(1.12at.％),the columnar crystals exhibited dense packing and uniform orientation.However,increasing Ta content led to increased columnar crystal width,irregular crystal structure arrangement,and the formation of inter-columnar gaps.The XRD analysis identified four primary diffraction peaks corresponding to CrN(111),(200),(220)and(311)planes,with peak positions at 37.9°,43.9°,64.3° and 76.8°,respectively.Compared with the CrN coatings,the incorporation of Ta introduced additional diffraction peaks corresponding to Cr(110),(200)and(211)crystal planes,suggesting incomplete nitridation of Cr during the deposition process,which was potentially due to suboptimal reaction conditions or excessive target current.The CrTaN coatings maintained a preferred CrN(111)orientation,with diffraction peaks gradually shifted to lower angles indicating lattice distortion effects induced by Ta incorporation.Notably,the emergence of Ta(111)and Ta(222)diffraction peaks in the Cr88Ta12N coatings confirmed the presence of metallic Ta in the coatings.Electrochemical evaluation demonstrated significant improvements in corrosion resistance with Ta incorporation.The CrTaN coatings exhibited lower corrosion current densities and increased charge transfer resistance compared with the CrN coatings.The enhanced corrosion resistance at lower Ta content was attributed to the formation of dense and continuous coatings with well-defined columnar structures,effectively inhibiting electrolyte penetration.However,further increase in Ta content beyond the optimal concentration led to structural modifications,including irregular columnar growth and gap formation,which facilitated electrolyte penetration and consequently increased corrosion rates of the coatings.Among all compositions,the Cr96Ta4N coatings exhibited superior corrosion resistance,with minimal corrosion current density(5.8× 10-6 A/cm2)and maximum charge transfer resistance(2 218 Ω/cm2).The potentiostatic polarization test showed that no obvious passivation film rupture or local corrosion occurred in the Cr96Ta4N coatings,while the pure CrN coatings experienced multiple passivation film ruptures accompanied by local corrosion.These findings provide valuable insights into the structure-property relationships in CrTaN coatings and establish optimal Ta content for enhanced corrosion protection in demanding applications.关键词
磁控溅射/CrN涂层/CrTaN涂层/Ta含量/微观组织/耐腐蚀性Key words
magnetron sputtering/CrN coating/CrTaN coating/Ta content/microstructure/corrosion resistance分类
金属材料引用本文复制引用
丁明理,张凤玲,张武,高峰,于鑫枫,卢旭东,郭策安..Ta含量对CrTaN涂层微观结构与耐腐蚀性能的影响[J].表面技术,2025,54(20):124-134,11.基金项目
辽宁省应用基础研究计划(2022JH2/101300006) （2022JH2/101300006）
辽宁省属本科高校基本科研业务费专项资金资助 （）
沈阳理工大学"光选"团队项目(2021004/SYLUGXTD5)The Research Project of Application Foundation of the Liaoning Province of China(2022JH2/101300006) （2021004/SYLUGXTD5）
The Special Fund of Basic Scientific Research Operating Expense of Undergraduate Universities in Liaoning Province （）
The Light-Selection Team Plan of the Shenyang Ligong University(2021004/S YLUGXTD5) （2021004/S YLUGXTD5）
