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Advancements and challenges in inverse lithography technology:a review of artificial intelligence-based approaches

Yixin Yang Kexuan Liu Yunhui Gao Chen Wang Liangcai Cao

光：科学与应用（英文版）2025，Vol.14Issue(9)：2384-2404,21.

光：科学与应用（英文版）2025，Vol.14Issue(9)：2384-2404,21.DOI:10.1038/s41377-025-01923-w

Advancements and challenges in inverse lithography technology:a review of artificial intelligence-based approaches

Yixin Yang ¹Kexuan Liu ¹Yunhui Gao ¹Chen Wang ²Liangcai Cao¹

作者信息

1. Department of Precision Instruments,Tsinghua University,Beijing 100084,China
2. School of Materials Science and Engineering,Tsinghua University,Beijing 100084,China
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摘要

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Yixin Yang,Kexuan Liu,Yunhui Gao,Chen Wang,Liangcai Cao..Advancements and challenges in inverse lithography technology:a review of artificial intelligence-based approaches[J].光：科学与应用（英文版）,2025,14(9):2384-2404,21.

基金项目

The authors acknowledge the funding support by the National Natural Science Foundation of China(62235009). （62235009）

光：科学与应用（英文版）

ISSN：2095-5545

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