光：科学与应用（英文版）2025，Vol.14Issue(9)：2821-2838,18.DOI:10.1038/s41377-025-01971-2
Broadband unidirectional visible imaging using wafer-scale nano-fabrication of multi-layer diffractive optical processors
Broadband unidirectional visible imaging using wafer-scale nano-fabrication of multi-layer diffractive optical processors
Che-Yung Shen 1Paolo Batoni 2Xilin Yang 1Jingxi Li 1Kun Liao 3Jared Stack 2Jeff Gardner 2Kevin Welch 2Aydogan Ozcan1
作者信息
- 1. Electrical and Computer Engineering Department,University of California,Los Angeles,CA 90095,USA||Bioengineering Department,University of California,Los Angeles,CA 90095,USA||California NanoSystems Institute(CNSI),University of California,Los Angeles,CA 90095,USA
- 2. Micro Optics,Optical Systems Division,Broadcom Inc.,Charlotte,NC 28262,USA
- 3. Electrical and Computer Engineering Department,University of California,Los Angeles,CA 90095,USA
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引用本文复制引用
Che-Yung Shen,Paolo Batoni,Xilin Yang,Jingxi Li,Kun Liao,Jared Stack,Jeff Gardner,Kevin Welch,Aydogan Ozcan..Broadband unidirectional visible imaging using wafer-scale nano-fabrication of multi-layer diffractive optical processors[J].光：科学与应用（英文版）,2025,14(9):2821-2838,18.
