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Ge/ZnS光子晶体的制备及其红外-透波性能OA

Fabrication of Ge/ZnS photonic crystal and its infrared-wave transmitting properties

中文摘要英文摘要

为解决Ge/ZnS光子晶体的红外隐身及雷达透波性能兼容度低的问题,采用TFCalc仿真软件模拟了 Ge/ZnS光子晶体结构,通过改变膜层厚度和周期,可实现其在3~5 μm波段的红外发射率低至0.005 9;并利用真空蒸镀技术分别探究了电子束束流和输出电压对Ge和ZnS单层膜沉积性能的影响规律.在此基础上,根据模拟结果利用较优参数制备了 Ge/ZnS光子晶体.结果表明,电子束流为90 mA和输出电压为220 V的40%时,Ge和ZnS单层膜的沉积性能较好;利用此参数制备的Ge/ZnS光子晶体3~5μm波段的发射率为0.055;12.4~18 GHz的介电常数在3.34~3.89之间,介质损耗角正切值在0.013 1~0.120 8之间,此时红外隐身及透波性能兼容度较高.

In order to solve the problem of low compatibility of infrared stealth and radar transmission performance of Ge/ZnS photonic crystal,the Ge/ZnS photonic crystal structure was simulated by TFCalc simulation software.By changing the thickness and period of the film,the infrared emissivity of 3~5 μm band can be realized as low as 0.005 9.The effects of electron beam current and output voltage on the deposition properties of Ge and ZnS monolayer films were investigated by vacuum evaporation technolo-gy.On this basis,Ge/ZnS photonic crystals were prepared by using better parameters according to the simulation results.The results show that the deposition performance of Ge and ZnS monolayer films is better when the electron beam current is 90 mA and the output voltage is 40%of 220 V,respectively.The emissivity of Ge/ZnS photonic crystal prepared by this parameter is 0.055 at 3~5 μm band.The di-electric constant in the range of 12.4~18 GHz is between 3.34~3.89,and the dielectric loss tangent is between 0.013 1~0.120 8.At this time,the compatibility of infrared stealth and wave transmission performance is high.

苏晓磊;王旭江;刘毅;卢琳琳

西安工程大学材料工程学院,陕西西安 710048西安工程大学材料工程学院,陕西西安 710048西安工程大学材料工程学院,陕西西安 710048西安工程大学材料工程学院,陕西西安 710048

光子晶体隐身技术真空蒸镀红外发射率透波性能

photonic crystalstealth technologyvacuum evaporationinfrared emissivitywave transmission performance

《纺织高校基础科学学报》 2025 (5)

35-44,10

陕西省秦创原"科学家+工程师"队伍项目(2025QCY-KXJ-193,2024QCY-KXJ-122)

10.13338/j.issn.1006-8341.2025.05.005

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