现代电子技术2025，Vol.48Issue(24)：36-40,5.DOI:10.16652/j.issn.1004-373x.2025.24.006
面向磁控溅射全过程的复杂电磁环境分析与优化
Analysis and optimization of complex electromagnetic environment for whole process of magnetron sputtering
摘要
Abstract
In magnetron sputtering process,magnetic field design is the core factor determining sputtering efficiency,film quality,and process economy.Based on the coupling mechanism of magnetic field-plasma-film performance,a dynamic adjustable magnetic field and multi-region collaborative optimization strategy are proposed to solve the control bottleneck of traditional static magnetic fields in complex processes.In allusion to the optimization problem of target material parameters,particle swarm optimization(PSO)algorithm is used to globally optimize key parameters such as magnetic yoke structure and magnetic field strength.In the multi-objective optimization process of the entire process,the non-dominated sorting genetic algorithm(NSGA-Ⅱ)is used to synchronously optimize the film uniformity,target utilization rate,deposition rate and energy efficiency,and construct Pareto optimal solution set.The experimental testing results show that the proposed method is superior to the comparison algorithm in terms of comprehensive evaluation indicators such as intergenerational distance(GD=4.58×10-5),spacing index(SP=7.55×10-3)and hypervolume(HV=0.551),which verifies that the method has good convergence,multi-objective collaborative optimization ability and comprehensive performance.关键词
磁控溅射/磁场分析/粒子群优化算法/非支配排序遗传算法/多目标优化/Pareto解集Key words
magnetron sputtering/magnetic field analysis/particle swarm optimization algorithm/non-dominated sorting genetic algorithm/multi-objective optimization/Pareto solution set分类
信息技术与安全科学引用本文复制引用
卿晓梅,丁友,马子超..面向磁控溅射全过程的复杂电磁环境分析与优化[J].现代电子技术,2025,48(24):36-40,5.基金项目
南通理工学院第一批科技创新与服务地方团队项目(KJCXTD113) （KJCXTD113）
南通市科技计划项目(JC2020131) （JC2020131）
