电子学报(英文)2025,Vol.34Issue(6):1661-1667,7.DOI:10.23919/cje.2025.00.096
A 1.5×109 ION/IOFF Ratio p-Channel InGaN MESFET with p-GaN/InGaN/AlN Composite-Channel and Tungsten Gate
A 1.5×109 ION/IOFF Ratio p-Channel InGaN MESFET with p-GaN/InGaN/AlN Composite-Channel and Tungsten Gate
摘要
关键词
InGaN channel/ION/IOFF ratio/p-Channel field-effect transistor/Hysteresis effect/Subthreshold swingKey words
InGaN channel/ION/IOFF ratio/p-Channel field-effect transistor/Hysteresis effect/Subthreshold swing引用本文复制引用
Huake Su,Tao Zhang,Shengrui Xu,Yuan Gao,Jingyu Jia,Jun Huang,Jincheng Zhang,Hongchang Tao,Yue Hao..A 1.5×109 ION/IOFF Ratio p-Channel InGaN MESFET with p-GaN/InGaN/AlN Composite-Channel and Tungsten Gate[J].电子学报(英文),2025,34(6):1661-1667,7.基金项目
This work was supported by the National Key R&D Pro-gram of China(Grant No.2022YFB3604400),the Key Research and Development Plan of Shaanxi Province(Grant No.2024GX-YBXM-082),the National Natural Science Foundation of China(Grant No.62104185),the Fundamental Research Funds for the Central Universi-ties(Grant Nos.QTZX23076,ZYTS25225,and ZYT S25216),the Natural Science Basic Research Program of Shaanxi Province(Grant No.2023-JC-JQ-56),and the Central Funds Guiding the Local Science and Technolo-gy Development Project of Hubei Province(Grant No.2022BFE001). (Grant No.2022YFB3604400)