液晶与显示2025，Vol.40Issue(12)：1800-1809,10.DOI:10.37188/CJLCD.2025-0200
偏光片褪色问题中氮化硅薄膜沉积的关键影响因子
Key influencing factors of silicon nitride thin film deposition in polarizer bleaching issue
WANG Zhiqiang 1TAN Yaohong 1SUN Wen 1ZHAO Wuyang 1SUN Fukun1
作者信息
- 1. Mianyang BOE Optoelectronics Technology Co.Ltd.,Mianyang 621000,China
- 折叠
摘要
Abstract
This study investigates the key factors in the plasma-enhanced chemical vapor deposition(PECVD)process for silicon nitride(SiNₓ)films to address the polarizer(POL)bleaching issue in flexible organic light-emitting diodes(OLEDs)under damp-heat conditions.A full factorial design of experiments was employed to systematically analyze the effects of radio frequency(RF)power and electrode spacing on film properties and polarizer bleaching behavior.The results demonstrate that both RF power(P=0.006)and electrode spacing(P=0.023)are significant factors affecting polarizer bleaching.The degree of bleaching exhibits a negative correlation with RF power and a positive correlation with electrode spacing,with the established linear model explaining 89.88%of the variation.No significant statistical association was found between film stress and polarizer bleaching(P=0.169),indicating that both are parallel responses to process parameters.The total bonded hydrogen content(N—H and Si—H bonds)in SiNₓ films shows a strong positive correlation with polarizer bleaching(P=0.007,R2=79.1%).As a key indicator of plasma dissociation capability,the voltage peak-to-peak(Vpp)value shows a significant negative correlation with bonded hydrogen content(P=0.015).Increasing RF power and reducing electrode spacing significantly enhance Vpp,thereby effectively reducing the total bonded hydrogen content in SiNₓ films and promoting the formation of a denser,more stable film structure.This reduction in bonded hydrogen content decreases the amount of ammonia released through oxidative degradation of SiNₓ films under damp-heat conditions,consequently minimizing its reaction with iodine ions in the polarizer and ultimately inhibiting polarizer bleaching.These findings significantly enhance the reliability of flexible OLEDs in damp-heat environments.关键词
偏光片褪色/离子体增强化学气相沉积/氮化硅/射频功率/电极间距/键合氢含量/电压峰峰值Key words
polarizer bleaching/plasma enhanced chemical vapor deposition/silicon nitride/RF power/electrode spacing/bonded hydrogen content/voltage peak-to-peak分类
信息技术与安全科学引用本文复制引用
WANG Zhiqiang,TAN Yaohong,SUN Wen,ZHAO Wuyang,SUN Fukun..偏光片褪色问题中氮化硅薄膜沉积的关键影响因子[J].液晶与显示,2025,40(12):1800-1809,10.
