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微纳米三坐标测量机的技术进展

HE Yaxiong LI Ruijun HUANG Qiangxian CHENG Zhenying FAN Guangzhao

光学精密工程2025,Vol.33Issue(23):3672-3690,19.
光学精密工程2025,Vol.33Issue(23):3672-3690,19.DOI:10.37188/OPE.20253323.3672

微纳米三坐标测量机的技术进展

Advances in micro/nano CMM

HE Yaxiong 1LI Ruijun 2HUANG Qiangxian 2CHENG Zhenying 2FAN Guangzhao2

作者信息

  • 1. School of Instrument Science and Opto-electronic Engineering,Hefei University of Technology,Hefei 230009,China||College of Metrology Measurement and Instrument,China Jiliang University,Hangzhou 310018,China
  • 2. School of Instrument Science and Opto-electronic Engineering,Hefei University of Technology,Hefei 230009,China
  • 折叠

摘要

Abstract

In the field of advanced manufacturing,ultra-precision components are indispensable for nation-al key equipment and high-end instruments,including aircraft engine fuel nozzles,precision gears,optical elements,and semiconductor devices.The characteristic dimensions of these components range from hun-dreds of micrometers to hundreds of millimeters,while the required dimensional accuracy can reach tens to hundreds of nanometers.To guarantee the quality and functional performance of such components,three-dimensional ultra-precision measurement is essential.This paper presents a comprehensive review of the development of micro-and nano-coordinate measuring machines(micro/nano CMMs)over the past two decades.The structural designs and measurement principles of micro/nano CMMs are systematically sum-marized,and key technologies—including error compensation methods,nano-probe design,measurement environment control,and system testing and application—are analyzed in depth.Particular emphasis is placed on the research progress and latest advances in four generations of micro/nano CMM prototypes de-veloped at Hefei University of Technology.Recent work is highlighted,including an innovative volumet-ric error modeling and compensation method for micro/nano CMMs based on the Abbe and Bryan princi-ples.This method enables nano-precision measurement of internal dimensions with characteristic sizes be-low 100 μm and large depth-to-width ratios.Finally,future research directions and potential application prospects of micro/nano CMMs in ultra-precision manufacturing are discussed.

关键词

精密测量/微机电系统(MEMS)/三坐标测量机(CMM)/高深宽比结构/纳米探头/阿贝误差/空间误差补偿

Key words

precision measurement/Micro-Electro-Mechanical System(MEMS)/Coordinate Measuring Machine(CMM)/high aspect ratio structures/nano probe/Abbe error/volumetric error compensation

分类

机械制造

引用本文复制引用

HE Yaxiong,LI Ruijun,HUANG Qiangxian,CHENG Zhenying,FAN Guangzhao..微纳米三坐标测量机的技术进展[J].光学精密工程,2025,33(23):3672-3690,19.

基金项目

国家重点研发计划资助项目(No.2019YFB2004900) (No.2019YFB2004900)

国家自然科学基金面上项目(No.51675157,No.52075143,No.52175506) (No.51675157,No.52075143,No.52175506)

光学精密工程

OA北大核心

1004-924X

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