金刚石与磨料磨具工程2025，Vol.45Issue(6)：752-758,7.DOI:10.13394/j.cnki.jgszz.2024.0127
氧化剂含量对硬质合金化学机械抛光性能的影响
Effect of oxidant content on CMP performance of cemented carbide
摘要
Abstract
Objectives:As an important part of the CMP slurry for cemented carbide,the oxidant content has an im-portant influence on the polishing performance.Through surface corrosion tests and CMP tests,the influence of oxidant content on the removal mechanism and the polishing performance of cemented carbide material is explored.Methods:Using hydrogen peroxide as the oxidant,the influence of oxidant content on the surface corrosion behavior of cemented carbide is studied through surface corrosion tests,and the corrosion mechanism is analyzed.Meanwhile,through CMP experiments,the influence laws of different oxidant contents on the material removal rate,the surface roughness and the surface morphology of CMP of cemented carbide are studied.Results:Hydrogen peroxide is an acid-ic and oxidizing electrolyte.When cemented carbide is placed in it,galvanic corrosion occurs due to the potential differ-ence between the hard phase WC and the bonding phase Co.In the process of galvanic corrosion,due to the high poten-tial of the bonding phase Co,it is corroded and dissolved as an anode,forming a soft and loose oxide layer on the sur-face of the workpiece,while the hard phase WC loses support and is exposed to the outside.When the oxidant content increases,the number of molecules in the reactants in the corrosive environment increases,and the effective collision frequency between molecules increases,which accelerates the chemical reaction and the formation rate of the oxide lay-er.In the process of CMP of YG8 cemented carbide,the increase in oxidant content accelerates the formation of the ox-ide layer.The oxide layer itself has low hardness and is loose,while the hardness of diamond abrasive is high.There-fore,the surface oxide layer is easily removed by abrasives,and the exposed workpiece surface undergoes further corro-sion and oxidation reaction,so that the material removal rate of CMP of cemented carbide is improved.When the mass fraction of oxidant is within the range of 0-30%,an increase in oxidant content accelerates chemical reactions and pro-motes mechanical removal,improving the material removal rate of CMP of cemented carbide.When the mass fraction of hydrogen peroxide is 30%,the material removal efficiency is 160.38 nm/min,which is 484%higher than that without the addition of oxidant.Meanwhile,under the chemical action of oxidants,a more easily removable oxide layer is formed on the defect surface of cemented carbide,thereby improving the surface quality of CMP of cemented carbide.However,when the content of oxidant is low,the formation rate of the oxide layer is slow,which does not match the mechanical removal rate of the abrasives,resulting in incomplete removal of surface defects.When the mass fraction of oxidant increases to 30%,a lower surface roughness value of 19.00 nm is obtained,which is 50%lower than that without oxidant.Conclusions:When the mass fraction of oxidant is within the range of 0-30%,increasing the oxidant content is beneficial for accelerating the formation of the soft and loose oxide layer on the surface of cemented carbide,improving the material removal rate and surface quality of CMP.关键词
YG8硬质合金/过氧化氢/氧化剂含量/化学机械抛光/材料去除率/表面粗糙度Key words
YG8 cemented carbide/hydrogen peroxide/oxidant content/chemical mechanical polishing(CMP)/mater-ial removal rate/surface roughness分类
矿业与冶金引用本文复制引用
王奔,徐仁杰,印文典,宋畅,张棋..氧化剂含量对硬质合金化学机械抛光性能的影响[J].金刚石与磨料磨具工程,2025,45(6):752-758,7.基金项目
辽宁省国际科技合作计划项目(2024JH2/101900028) （2024JH2/101900028）
辽宁省教育厅项目(LJ212410143061). （LJ212410143061）
