化学工程2026，Vol.54Issue(1)：40-45,6.DOI:10.3969/j.issn.1005-9954.2026.01.007
N-甲基吡咯烷酮金属杂质离子吸附脱除及其模拟
Adsorption removal of metal impurity ion in N-methyl-2-pyrrolidone and its simulation
摘要
Abstract
Iminodiacetic acid macroporous cationic chelating resin LSC-100 was studied for its adsorption of trace amounts of Na+and Ni2+in NMP(N-methyl-2-pyrrolidone).Through static adsorption experiments,the influences of resin types,adsorption time and initial solution mass concentration on the adsorption process were investigated.The dynamic adsorption process of NMP was simulated by Aspen Adsorption and was compared with the dynamic adsorption experiment.The resin was digested by the nitric acid-hydrogen peroxide method and its metal ion mass concentration was measured.The saturated resin was regenerated by the hydrochloric acid regeneration method.The results show that the static adsorption process conforms to the pseudo-first-order kinetic model,the intraparticle diffusion model and Langmuir model.The maximum adsorption capacity of the resin for Na+is 3.582 mg/g,and that for Ni2+is 5.017 mg/g.The adsorption simulation curve obtained from Aspen Adsorption shows a good agreement with the experimental curve,and the dynamic adsorption process conforms to Thomas model.After five times of regeneration,the adsorption resin still has removal rates of 82.19%and 88.45%for Na+and Ni2+respectively.After the resin adsorption,the mass concentration of metal impurity ions in NMP decreases to below 1 μg/L,indicating that it is feasible to obtain electronic-grade NMP by removing metal impurity ions through resin adsorption,and thus it has a good application prospect.关键词
电子级NMP/金属杂质离子/亚氨基二乙酸大孔阳离子螯合树脂/吸附/Aspen Adsorption模拟Key words
electronic grade NMP/metal impurity ions/iminodiacetic acid macroporous cation chelating resin/adsorption/Aspen Adsorption simulation分类
化学化工引用本文复制引用
张宇军,陈啸龙,许振良,程亮,杨宏勋,凌芳..N-甲基吡咯烷酮金属杂质离子吸附脱除及其模拟[J].化学工程,2026,54(1):40-45,6.基金项目
国药集团化学试剂有限公司课题(A200-82410) （A200-82410）
国家重点研发计划课题(2021YFB3801103) （2021YFB3801103）
