热带亚热带植物学报2026,Vol.34Issue(1):72-82,11.DOI:10.11926/jtsb.4978
内生真菌印度梨形孢增强烟草耐寒性的作用机制研究
Study on Mechanism of Endophytic Fungus Piriformospora indica Enhancing Cold Tolerance in Tobacco
摘要
Abstract
Tobacco is a warm-loving crop that is sensitive to low temperatures.During the floating seedling stage,it is vulnerable to adverse effects from cold spells such as"late spring cold"and low light.To address the issues of slow growth and reduced survival rate of tobacco seedlings caused by such cold spells,this study explored the colonization effect of the endophytic fungus Piriformospora indica in tobacco roots and its mechanism for enhancing tobacco cold resistance without altering the current floating seedling cultivation method.The results showed that the colonization of P.indica in the roots of tobacco seedlings significantly increased the activity of the antioxidant enzyme system,including SOD,CAT,POD,and APX,in tobacco,effectively curbing the excessive accumulation of reactive oxygen species(ROS).Additionally,P.indica promoted the accumulation of osmotic adjustment substances in tobacco,including soluble sugars,proline,and soluble proteins.Moreover,Piriformospora indica could further stimulate the expression of cold response genes and enhance the photosynthetic capacity of tobacco by promoting chlorophyll synthesis and the efficiency of photosystem II(PSII).This study clarified the multi-pathway mechanism by which P.indica enhances tobacco cold resistance and provided an effective strategy for promoting the growth of tobacco seedlings under low temperature.关键词
印度梨形孢/烟草/抗寒性/活性氧/渗透调节物质/光合作用Key words
Piriformospora indica/Tobacco/Cold resistance/Reactive oxygen/Osmolytes/Photosynthesis引用本文复制引用
王致尧,李寒,何小亚,高维常,朱经伟,张恒,刘艳霞,李想..内生真菌印度梨形孢增强烟草耐寒性的作用机制研究[J].热带亚热带植物学报,2026,34(1):72-82,11.基金项目
中国烟草总公司贵州省公司重大专项项目(2022XM03) (2022XM03)
贵州省科技计划项目(ZK[2024]-646)资助 This work was supported by the Major Project of China Tobacco Guizhou Industrial Co.,Ltd.(Grant No.2022XM03),and the Project for Science and Technology Plan in Guizhou(Grant No.ZK[2024]-646). (ZK[2024]-646)