首页|期刊导航|Industrial Chemistry & Materials|Engineering sulfonated polymers for the removal of ultra-trace complexed Cr(Ⅲ)in tris(2-carboxyethyl)isocyanurate photoresist resin monomers

Engineering sulfonated polymers for the removal of ultra-trace complexed Cr(Ⅲ)in tris(2-carboxyethyl)isocyanurate photoresist resin monomers

Huiyao Huang Shiquan Zhong Yawen Chen Wangquan Gong Changshen Ye Ting Qiu Jie Chen

Industrial Chemistry & Materials2025，Vol.3Issue(5)：P.618-630,13.

Industrial Chemistry & Materials2025，Vol.3Issue(5)：P.618-630,13.DOI:10.1039/d5im00057b

Engineering sulfonated polymers for the removal of ultra-trace complexed Cr(Ⅲ)in tris(2-carboxyethyl)isocyanurate photoresist resin monomers

Huiyao Huang ¹Shiquan Zhong ¹Yawen Chen ²Wangquan Gong ²Changshen Ye ¹Ting Qiu ³Jie Chen¹

作者信息

1. College of Chemical Engineering,Fuzhou University,Fuzhou,350108,China Qingyuan Innovation Laboratory,Quanzhou 362801,P.R.China
2. College of Chemical Engineering,Fuzhou University,Fuzhou,350108,China
3. College of Chemical Engineering,Fuzhou University,Fuzhou,350108,China Qingyuan Innovation Laboratory,Quanzhou 362801,P.R.China Fuzhou University International Joint Laboratory of Thermochemical Conversion of Biomass,Fuzhou University,Fuzhou,350108,China
折叠

摘要

关键词

Tris(2-carboxyethyl)isocyanurate/Complexed Cr(Ⅲ)/Ultra-trace/Cr(Ⅲ)removal/Sulfonated polymers

分类

化学化工

引用本文复制引用

Huiyao Huang,Shiquan Zhong,Yawen Chen,Wangquan Gong,Changshen Ye,Ting Qiu,Jie Chen..Engineering sulfonated polymers for the removal of ultra-trace complexed Cr(Ⅲ)in tris(2-carboxyethyl)isocyanurate photoresist resin monomers[J].Industrial Chemistry & Materials,2025,3(5):P.618-630,13.

基金项目

supported by the National Natural Science Foundation of China(Grant No.22478077,22278077). （Grant No.22478077,22278077）

Industrial Chemistry & Materials

ISSN：2755-2608

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