首页|期刊导航|Industrial Chemistry & Materials|Lithographic performances of aryl sulfonate estermodified polystyrenes as nonchemically amplified resists

Lithographic performances of aryl sulfonate estermodified polystyrenes as nonchemically amplified resists

Rongrong Peng Peng Lian Jinping Chen Tianjun Yu Yi Zeng Shuangqing Wang Xudong Guo Rui Hu Jun Zhao Yanqing Wu Guoqiang Yang Yi Li

Industrial Chemistry & Materials2025，Vol.3Issue(5)：P.553-566,14.

Industrial Chemistry & Materials2025，Vol.3Issue(5)：P.553-566,14.DOI:10.1039/d5im00046g

Lithographic performances of aryl sulfonate estermodified polystyrenes as nonchemically amplified resists

Rongrong Peng ¹Peng Lian ¹Jinping Chen ¹Tianjun Yu ¹Yi Zeng ¹Shuangqing Wang ²Xudong Guo ²Rui Hu ²Jun Zhao ³Yanqing Wu ³Guoqiang Yang ²Yi Li¹

作者信息

1. Key Laboratory of Photochemical Conversion and Optoelectronic Materials,Technical Institute of Physics and Chemistry,University of Chinese Academy of Sciences,Chinese Academy of Sciences,Beijing 100190,China
2. Key Laboratory of Photochemistry,Institute of Chemistry,University of Chinese Academy of Sciences,Chinese Academy of Sciences,Beijing 100190,China
3. Shanghai Synchrotron Radiation Facility,Advanced Research Institute,Chinese Academy of Sciences,Shanghai 201204,China
折叠

摘要

关键词

Nonchemically amplified resist/Reversible addition-fragmentation chain transfer polymerization/Aryl sulfonate/Electron beam lithography/Extreme ultraviolet lithography

分类

化学化工

引用本文复制引用

Rongrong Peng,Peng Lian,Jinping Chen,Tianjun Yu,Yi Zeng,Shuangqing Wang,Xudong Guo,Rui Hu,Jun Zhao,Yanqing Wu,Guoqiang Yang,Yi Li..Lithographic performances of aryl sulfonate estermodified polystyrenes as nonchemically amplified resists[J].Industrial Chemistry & Materials,2025,3(5):P.553-566,14.

基金项目

supported by the National Natural Science Foundation of China(22090012,22475224). （22090012,22475224）

Industrial Chemistry & Materials

ISSN：2755-2608

访问量0

下载量0

段落导航