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Hybrid alkyl-ligand tin-oxo clusters for enhanced lithographic patterning performance via intramolecular interactions

Hao Chen Wenzheng Li Yingdong Zhao Xinyan Huang Jialong Zhang Peijun Ji Jun Zhao Pengzhong Chen Xiaojun Peng

Industrial Chemistry & Materials2025，Vol.3Issue(5)：P.543-552,10.

Industrial Chemistry & Materials2025，Vol.3Issue(5)：P.543-552,10.DOI:10.1039/d5im00058k

Hybrid alkyl-ligand tin-oxo clusters for enhanced lithographic patterning performance via intramolecular interactions

Hao Chen ¹Wenzheng Li ¹Yingdong Zhao ¹Xinyan Huang ¹Jialong Zhang ²Peijun Ji ²Jun Zhao ³Pengzhong Chen ¹Xiaojun Peng⁴

作者信息

1. State Key Laboratory of Fine Chemicals,Frontiers Science Center for Smart Materials,School of Chemical Engineering,Dalian University of Technology,Dalian 116024,China
2. Sinopec Shanghai Research Institute of Petrochemical Technology Co.,Ltd.,Shanghai 201208,China
3. Shanghai Advanced Research Institute,Chinese Academy of Sciences,Shanghai 201203,China
4. State Key Laboratory of Fine Chemicals,Frontiers Science Center for Smart Materials,School of Chemical Engineering,Dalian University of Technology,Dalian 116024,China State Key Laboratory of Fine Chemicals,College of Materials Science and Engineering,Shenzhen University,Shenzhen 518060,China
折叠

摘要

关键词

Tin-oxo clusters/Intramolecular radical regulation/Photoresist/Electron beam lithography/Extreme ultraviolet lithography

分类

化学化工

引用本文复制引用

Hao Chen,Wenzheng Li,Yingdong Zhao,Xinyan Huang,Jialong Zhang,Peijun Ji,Jun Zhao,Pengzhong Chen,Xiaojun Peng..Hybrid alkyl-ligand tin-oxo clusters for enhanced lithographic patterning performance via intramolecular interactions[J].Industrial Chemistry & Materials,2025,3(5):P.543-552,10.

基金项目

supported by the National Natural Science Foundation of China(22378052,22090010,22090011) （22378052,22090010,22090011）

the Fundamental Research Funds for the Central Universities(DUT22LAB608) （DUT22LAB608）

the Liaoning Provincial Science and Technology Joint Fund(2023JH2/101800039). （2023JH2/101800039）

Industrial Chemistry & Materials

ISSN：2755-2608

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