首页|期刊导航|Journal of Materiomics|Utilization of oxygen content modulated Ru electrode to examine the interfacial redox chemistry of ferroelectric Hf_(0.5)Zr_(0.5)O_(2)

Utilization of oxygen content modulated Ru electrode to examine the interfacial redox chemistry of ferroelectric Hf_(0.5)Zr_(0.5)O_(2)

Kun Yang Hyojun Choi Ji Sang Ahn Eun Ji Ju Dong In Han Se Hyun Kim Ju Yong Park Heejin Hong Kwan Hyun Park Jeong Hwan Han Min Hyuk Park

Journal of Materiomics2025，Vol.11Issue(6)：P.263-273,11.

Journal of Materiomics2025，Vol.11Issue(6)：P.263-273,11.DOI:10.1016/j.jmat.2025.101110

Utilization of oxygen content modulated Ru electrode to examine the interfacial redox chemistry of ferroelectric Hf_(0.5)Zr_(0.5)O_(2)

Kun Yang ¹Hyojun Choi ¹Ji Sang Ahn ²Eun Ji Ju ²Dong In Han ¹Se Hyun Kim ¹Ju Yong Park ¹Heejin Hong ¹Kwan Hyun Park ¹Jeong Hwan Han ²Min Hyuk Park³

作者信息

1. Department of Materials Science and Engineering&Inter-university Semiconductor Research Center,College of Engineering,Seoul National University,Seoul,08826,Republic of Korea
2. Department of Materials Science and Engineering,Seoul National University of Science and Technology,Seoul,01811,Republic of Korea
3. Department of Materials Science and Engineering&Inter-university Semiconductor Research Center,College of Engineering,Seoul National University,Seoul,08826,Republic of Korea Research Institute of Advanced Materials,Seoul National University,Seoul,08826,Republic of Korea Institute of Engineering Research,College of Engineering,Seoul National University,Seoul,08826,Republic of Korea
折叠

摘要

关键词

Ferroelectric/Hafnium oxide/Zirconium oxide/Ruthenium/Interface chemistry

分类

化学化工

引用本文复制引用

Kun Yang,Hyojun Choi,Ji Sang Ahn,Eun Ji Ju,Dong In Han,Se Hyun Kim,Ju Yong Park,Heejin Hong,Kwan Hyun Park,Jeong Hwan Han,Min Hyuk Park..Utilization of oxygen content modulated Ru electrode to examine the interfacial redox chemistry of ferroelectric Hf_(0.5)Zr_(0.5)O_(2)[J].Journal of Materiomics,2025,11(6):P.263-273,11.

基金项目

supported by the National Research Foundation of Korea,funded by the Ministry of Science and ICT(RS-2024-00445552)(50%) （RS-2024-00445552）

supported by the Technology Innovation Program(RS-2024-00509266,Development of Next-generation dielectric and electrode process equipment for logic 1 nm or less and memory x nm level)funded By the Ministry of Trade Industry&Energy(MOTIE,Korea). （RS-2024-00509266,Development of Next-generation dielectric and electrode process equipment for logic 1 nm or less and memory x nm level）

Journal of Materiomics

ISSN：2352-8478

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