首页|期刊导航|Journal of Materiomics|Enhancing ferroelectric properties of Hf_(0.5)Zr_(0.5)O_(2)thin films using the HfN/TiN and W/TiN bi-layer bottom electrodes

Enhancing ferroelectric properties of Hf_(0.5)Zr_(0.5)O_(2)thin films using the HfN/TiN and W/TiN bi-layer bottom electrodes

Han Sol Park Joong Chan Shin Kyung Do Kim Seong Jae Shin Jae Hee Song Seung Kyu Ryoo In Soo Lee Suk Hyun Lee Hyunwoo Nam Cheol Seong Hwang

Journal of Materiomics2025，Vol.11Issue(6)：P.252-262,11.

Journal of Materiomics2025，Vol.11Issue(6)：P.252-262,11.DOI:10.1016/j.jmat.2025.101109

Enhancing ferroelectric properties of Hf_(0.5)Zr_(0.5)O_(2)thin films using the HfN/TiN and W/TiN bi-layer bottom electrodes

Han Sol Park ¹Joong Chan Shin ¹Kyung Do Kim ¹Seong Jae Shin ¹Jae Hee Song ¹Seung Kyu Ryoo ¹In Soo Lee ¹Suk Hyun Lee ¹Hyunwoo Nam ¹Cheol Seong Hwang¹

作者信息

1. Department of Materials Science and Engineering and Inter-University Semiconductor Research Center,College of Engineering,Seoul National University,Gwanak-ro 1,Gwanak-gu,Seoul,08826,Republic of Korea
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摘要

关键词

Ferroelectric/Hf0.5Zr0.5O2/Coefficient of thermal expansion/Tensile stress/Bi-layer bottom electrode

分类

通用工业技术

引用本文复制引用

Han Sol Park,Joong Chan Shin,Kyung Do Kim,Seong Jae Shin,Jae Hee Song,Seung Kyu Ryoo,In Soo Lee,Suk Hyun Lee,Hyunwoo Nam,Cheol Seong Hwang..Enhancing ferroelectric properties of Hf_(0.5)Zr_(0.5)O_(2)thin films using the HfN/TiN and W/TiN bi-layer bottom electrodes[J].Journal of Materiomics,2025,11(6):P.252-262,11.

基金项目

supported by the National Research Foundation of Korea(Grant No.2020R1A3B2079882). （Grant No.2020R1A3B2079882）

Journal of Materiomics

ISSN：2352-8478

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