首页|期刊导航|Journal of Materiomics|Influence of deposition temperature and precursor chemistry on the properties of atomic layer deposited Hf_(0.5)Zr_(0.5)O_(2)thin films

Influence of deposition temperature and precursor chemistry on the properties of atomic layer deposited Hf_(0.5)Zr_(0.5)O_(2)thin films

Seong Jae Shin Hani Kim Seungyong Byun Jonghoon Shin Jinwoo Choi Suk Hyun Lee Kyung Do Kim Jae Hee Song Dong Hoon Shin Soo Hyung Lee In Soo Lee Hyunwoo Nam Cheol Seong Hwang

Journal of Materiomics2025，Vol.11Issue(6)：P.235-244,10.

Journal of Materiomics2025，Vol.11Issue(6)：P.235-244,10.DOI:10.1016/j.jmat.2025.101101

Influence of deposition temperature and precursor chemistry on the properties of atomic layer deposited Hf_(0.5)Zr_(0.5)O_(2)thin films

Seong Jae Shin ¹Hani Kim ¹Seungyong Byun ¹Jonghoon Shin ¹Jinwoo Choi ¹Suk Hyun Lee ¹Kyung Do Kim ¹Jae Hee Song ¹Dong Hoon Shin ¹Soo Hyung Lee ¹In Soo Lee ¹Hyunwoo Nam ¹Cheol Seong Hwang¹

作者信息

1. Department of Materials Science and Engineering&Inter-University Semiconductor Research Center,College of Engineering,Seoul National University,Gwanak-ro 1,Gwanak-gu,Seoul,08826,Republic of Korea
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摘要

关键词

Ferroelectric Hf_(0.5)Zr_(0.5)O_(2)/Atomic layer deposition/CP-Linked precursor/Deposition temperature/In-situ crystallization/Film thickness/In-plane strain

分类

通用工业技术

引用本文复制引用

Seong Jae Shin,Hani Kim,Seungyong Byun,Jonghoon Shin,Jinwoo Choi,Suk Hyun Lee,Kyung Do Kim,Jae Hee Song,Dong Hoon Shin,Soo Hyung Lee,In Soo Lee,Hyunwoo Nam,Cheol Seong Hwang..Influence of deposition temperature and precursor chemistry on the properties of atomic layer deposited Hf_(0.5)Zr_(0.5)O_(2)thin films[J].Journal of Materiomics,2025,11(6):P.235-244,10.

基金项目

supported by SK hynix Inc.under its Center of Material Research for Semiconductors(C-MRS)program. （C-MRS）

Journal of Materiomics

ISSN：2352-8478

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