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垂直布里奇曼法生长4英寸Fe掺杂(010)β-氧化镓及其性能表征

李明 叶浩函 王琤 沈典宇 王芸霞 王嘉君 夏宁 张辉 杨德仁

人工晶体学报2026,Vol.55Issue(1):52-57,6.
人工晶体学报2026,Vol.55Issue(1):52-57,6.DOI:10.16553/j.cnki.issn1000-985x.2025.0159

垂直布里奇曼法生长4英寸Fe掺杂(010)β-氧化镓及其性能表征

Growth and Properties of 4-Inch Fe Doped(010)β-Gallium Oxide Using Vertical Bridgman Method

李明 1叶浩函 1王琤 2沈典宇 2王芸霞 2王嘉君 2夏宁 2张辉 1杨德仁1

作者信息

  • 1. 浙江大学材料科学与工程学院,硅及先进半导体全国重点实验室,杭州 310027||浙江大学杭州国际科创中心先进半导体研究院,杭州 310027
  • 2. 杭州镓仁半导体有限公司,杭州 311200
  • 折叠

摘要

Abstract

In this study,a self-built vertical Bridgman(VB)system was utilized to grow large-size,high-quality Fe-doped β-Ga2O3 single crystals.Through iterative thermal field optimization via simulation,slightly convex solid-liquid interface and appropriate temperature gradient were achieved.The as-grown crystal was further processed into a high-quality 4-inch(010)oriented semi-insulating substrate.Comprehensive evaluations of crystallinity,surface morphology,and electrical properties were carried out.The substrate exhibits no macroscopic defects such as cracks.Multi-point X-ray rocking curve measurements show full width at half maximum(FWHM)values all below 50″,indicating superior crystalline quality.Surface topography tests reveal a maximum roughness of 0.074 nm,local thickness variation(LTV)below 3.4 µm,total thickness variation(TTV)of 4.157 µm,warp of 5.886 µm,and bow of 1.103 µm,demonstrating excellent processing quality.Moreover,the substrate displays high average resistivity of approximately 7.9×1010 Ω·cm with an in-plane inhomogeneity of about 7.77%,underscoring the effectiveness of VB method in achieving uniform doping distribution and its potential for radio frequency(RF)and microwave device applications.

关键词

氧化镓/宽禁带半导体/晶体生长/垂直布里奇曼/单晶衬底/掺杂

Key words

Ga2O3/wide-bandgap semiconductor/crystal growth/vertical Bridgman/single crystal substrate/doping

分类

数理科学

引用本文复制引用

李明,叶浩函,王琤,沈典宇,王芸霞,王嘉君,夏宁,张辉,杨德仁..垂直布里奇曼法生长4英寸Fe掺杂(010)β-氧化镓及其性能表征[J].人工晶体学报,2026,55(1):52-57,6.

基金项目

浙江省"尖兵""领雁"研发攻关计划(2023C01193) (2023C01193)

国家重点研发计划(2024YFE0205300) (2024YFE0205300)

人工晶体学报

1000-985X

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