首页|期刊导航|半导体学报(英文版)|Tailoring oxygen vacancies in Ni-doped In2O3 for improved thin-film transistor stability and performance via solution processing
半导体学报(英文版)2026,Vol.47Issue(2):60-71,12.DOI:10.1088/1674-4926/25030033
Tailoring oxygen vacancies in Ni-doped In2O3 for improved thin-film transistor stability and performance via solution processing
Tailoring oxygen vacancies in Ni-doped In2O3 for improved thin-film transistor stability and performance via solution processing
摘要
关键词
thin-film transistors/Ni-doped In2O3/solution processing/bias illumination stabilityKey words
thin-film transistors/Ni-doped In2O3/solution processing/bias illumination stability引用本文复制引用
Fakhari Alam,Sara Ajmal,Muhammad Asim Shahzad,Ghulam Dastgeer,Aamir Rasheed,Gang He..Tailoring oxygen vacancies in Ni-doped In2O3 for improved thin-film transistor stability and performance via solution processing[J].半导体学报(英文版),2026,47(2):60-71,12.基金项目
This research is funded by the research startup funding of National Research Foundation(NRF)of Korea through the Ministry of Science and ICT 2022R1G1A1009887.Part of this study was supported by research start-up funding of Anhui University(S202418001/078). (NRF)