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Topological edge state cavities:simultaneous enhancement of quality factor and free spectral range

Shaoqi Ding Zhihao Wang Cuicui Lu

光:科学与应用(英文版)2026,Vol.15Issue(1):19-21,3.
光:科学与应用(英文版)2026,Vol.15Issue(1):19-21,3.DOI:10.1038/s41377-025-02104-5

Topological edge state cavities:simultaneous enhancement of quality factor and free spectral range

Topological edge state cavities:simultaneous enhancement of quality factor and free spectral range

Shaoqi Ding 1Zhihao Wang 1Cuicui Lu1

作者信息

  • 1. Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurements of the Ministry of Education,Beijing Key Laboratory of Nanophotonics and Ultrafine Optoelectronic Systems,State Key Laboratory of Chips and Systems for Advanced Light Field Display,Center for Interdisciplinary Science of Optical Quantum and NEMS Integration,School of Physics,Beijing Institute of Technology,Beijing 100081,China
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摘要

引用本文复制引用

Shaoqi Ding,Zhihao Wang,Cuicui Lu..Topological edge state cavities:simultaneous enhancement of quality factor and free spectral range[J].光:科学与应用(英文版),2026,15(1):19-21,3.

基金项目

This work was supported by the National Natural Science Foundation of China(12274031 and 12574334)and the Fundamental Research Funds for the Central Universities(2025CX01017). (12274031 and 12574334)

光:科学与应用(英文版)

2095-5545

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