国家科学评论(英文版)2026,Vol.13Issue(3):179-189,11.DOI:10.1093/nsr/nwaf562
Co-field-reconciled direct growth of 6-inch monolayer graphene
Co-field-reconciled direct growth of 6-inch monolayer graphene
摘要
关键词
graphene/6-inch wafer/direct growth/batch uniformity/co-field optimizationKey words
graphene/6-inch wafer/direct growth/batch uniformity/co-field optimization引用本文复制引用
Feifan Liu,Qingqing Ji,Zhongfan Liu,Jingyu Sun,Li Jia,Aoran Li,Yinghan Li,Wenze Wei,Yuanyuan Qiu,Ziang Chen,Kaixuan Zhou,Ting Cheng..Co-field-reconciled direct growth of 6-inch monolayer graphene[J].国家科学评论(英文版),2026,13(3):179-189,11.基金项目
This work was supported by the National Natural Science Foundation of China(T2188101)and the National Key R&D Program of China(2019YFA0708201).The authors also ac-knowledge support from the Key Laboratory of Advanced Car-bon Materials and Wearable Energy Technologies of Jiangsu Province,China. (T2188101)