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Co-field-reconciled direct growth of 6-inch monolayer graphene

Feifan Liu Qingqing Ji Zhongfan Liu Jingyu Sun Li Jia Aoran Li Yinghan Li Wenze Wei Yuanyuan Qiu Ziang Chen Kaixuan Zhou Ting Cheng

国家科学评论(英文版)2026,Vol.13Issue(3):179-189,11.
国家科学评论(英文版)2026,Vol.13Issue(3):179-189,11.DOI:10.1093/nsr/nwaf562

Co-field-reconciled direct growth of 6-inch monolayer graphene

Co-field-reconciled direct growth of 6-inch monolayer graphene

Feifan Liu 1Qingqing Ji 2Zhongfan Liu 3Jingyu Sun 1Li Jia 3Aoran Li 2Yinghan Li 1Wenze Wei 1Yuanyuan Qiu 2Ziang Chen 4Kaixuan Zhou 3Ting Cheng5

作者信息

  • 1. College of Energy,Soochow Institute for Energy and Materials Innovations,Jiangsu Key Laboratory of Advanced Negative Carbon Technologies,Soochow University,Suzhou 215006,China||Beijing Graphene Institute,Beijing 100095,China
  • 2. School of Physical Science and Technology,ShanghaiTech University,Shanghai 201210,China
  • 3. Beijing Graphene Institute,Beijing 100095,China
  • 4. College of Energy,Soochow Institute for Energy and Materials Innovations,Jiangsu Key Laboratory of Advanced Negative Carbon Technologies,Soochow University,Suzhou 215006,China
  • 5. Department of Chemistry,City University of Hong Kong,Hong Kong 999077,China
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摘要

关键词

graphene/6-inch wafer/direct growth/batch uniformity/co-field optimization

Key words

graphene/6-inch wafer/direct growth/batch uniformity/co-field optimization

引用本文复制引用

Feifan Liu,Qingqing Ji,Zhongfan Liu,Jingyu Sun,Li Jia,Aoran Li,Yinghan Li,Wenze Wei,Yuanyuan Qiu,Ziang Chen,Kaixuan Zhou,Ting Cheng..Co-field-reconciled direct growth of 6-inch monolayer graphene[J].国家科学评论(英文版),2026,13(3):179-189,11.

基金项目

This work was supported by the National Natural Science Foundation of China(T2188101)and the National Key R&D Program of China(2019YFA0708201).The authors also ac-knowledge support from the Key Laboratory of Advanced Car-bon Materials and Wearable Energy Technologies of Jiangsu Province,China. (T2188101)

国家科学评论(英文版)

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